Silicon dioxide lamellar gratings fabricated by a new technique combining holographic exposure and reactive ion-beam etching are found experimentally to be appropriate to and useful for synchrotron radiation spectroscopy. Methods to improve edge roughness and to control the land-to-groove width ratio are also investigated. The fabrication technique developed here is relatively simple in comparison with the ruling technique which needs delicate control. Therefore, it is a promising way to employ these bakable original gratings for synchrotron radiation spectroscopy.
© 1982 Optical Society of America
Shinji Matsui, Kazuyuki Moriwaki, Hiroaki Aritome, Susumu Namba, Shik Shin, and Shigemasa Suga, "X-ray diffraction gratings for synchrotron radiation spectroscopy: a new fabrication method," Appl. Opt. 21, 2787-2793 (1982)