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Applied Optics

Applied Optics


  • Vol. 21, Iss. 16 — Aug. 15, 1982
  • pp: 2894–2896

Determination of 2-D thickness distributions of low absorbing thin films by new laser interferometry

Teruhito Mishima and Kwan C. Kao  »View Author Affiliations

Applied Optics, Vol. 21, Issue 16, pp. 2894-2896 (1982)

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New laser interferometry has been developed for determination of thickness distributions of low absorbing films on transparent substrates. This technique is suitable for films with either a gradual change or a step change in thickness. With this technique we have obtained fringe patterns showing the 2-D thickness distribution of Se films. This technique is simple and nondestructive without involving computations for films with low absorption and substrates transparent to the laser beam.

© 1982 Optical Society of America

Original Manuscript: March 24, 1982
Published: August 15, 1982

Teruhito Mishima and Kwan C. Kao, "Determination of 2-D thickness distributions of low absorbing thin films by new laser interferometry," Appl. Opt. 21, 2894-2896 (1982)

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  1. M. Born, E. Wolf, Principles of Optics (Pergamon, Oxford, 1975), Chap. 7.
  2. A. M. Goodman, Appl. Opt. 17, 2779 (1978). [CrossRef] [PubMed]
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