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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 21, Iss. 16 — Aug. 15, 1982
  • pp: 2894–2896

Determination of 2-D thickness distributions of low absorbing thin films by new laser interferometry

Teruhito Mishima and Kwan C. Kao  »View Author Affiliations


Applied Optics, Vol. 21, Issue 16, pp. 2894-2896 (1982)
http://dx.doi.org/10.1364/AO.21.002894


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Abstract

New laser interferometry has been developed for determination of thickness distributions of low absorbing films on transparent substrates. This technique is suitable for films with either a gradual change or a step change in thickness. With this technique we have obtained fringe patterns showing the 2-D thickness distribution of Se films. This technique is simple and nondestructive without involving computations for films with low absorption and substrates transparent to the laser beam.

© 1982 Optical Society of America

History
Original Manuscript: March 24, 1982
Published: August 15, 1982

Citation
Teruhito Mishima and Kwan C. Kao, "Determination of 2-D thickness distributions of low absorbing thin films by new laser interferometry," Appl. Opt. 21, 2894-2896 (1982)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-21-16-2894


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References

  1. M. Born, E. Wolf, Principles of Optics (Pergamon, Oxford, 1975), Chap. 7.
  2. A. M. Goodman, Appl. Opt. 17, 2779 (1978). [CrossRef] [PubMed]
  3. L. R. Fisher, N. S. Parker, F. Sharples, Opt. Eng. 19, 798 (1980). [CrossRef]
  4. T. Mishima, K. C. Kao, Appl. Opt. 21, 1101 (1982). [CrossRef] [PubMed]
  5. T. Mishima, K. C. Kao, Appl. Opt. 20, 3719 (1981). [CrossRef] [PubMed]
  6. H. Adachi, K. C. Kao, J. Appl. Phys. 51, 6326 (1980). [CrossRef]

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