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Applied Optics

Applied Optics


  • Vol. 22, Iss. 19 — Oct. 1, 1983
  • pp: 3121–3127

Refractive index and attenuation characteristics of SiO2–Ta2O5 optical waveguide film

Mario Kobayashi and Hiroshi Terui  »View Author Affiliations

Applied Optics, Vol. 22, Issue 19, pp. 3121-3127 (1983)

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The refractive index and optical attenuation of sputtered SiO2–Ta2O5 waveguide film were measured in the 0.633–1.32-μm wavelength region. The waveguide film had a large refractive-index range of 1.46–2.08, which can be adjusted by suitable selection of the composition ratio of the SiO2–Ta2O5 target. Substrate heating, up to 270°C, during the sputtering process was effective for obtaining low attenuation. The waveguide films showed low attenuations, <0.41 dB/cm for the TE0 mode. The best fits of the form λ γ to the measured attenuation have γ between 0 and −1, where λ is the wavelength. This wavelength dependence of the attenuation can be interpreted based on mode conversions due to the film surface roughness.

© 1983 Optical Society of America

Original Manuscript: March 2, 1983
Published: October 1, 1983

Mario Kobayashi and Hiroshi Terui, "Refractive index and attenuation characteristics of SiO2–Ta2O5 optical waveguide film," Appl. Opt. 22, 3121-3127 (1983)

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