The complex dielectric function of SiO0.6N0.2 coatings, produced by reactive electron-beam deposition, was evaluated in the 5–50-μm range. The composition was determined by Rutherford backscattering spectrometry. The IR optical properties of the films make them well suited for radiative cooling applications.
© 1983 Optical Society of America
Original Manuscript: May 28, 1983
Published: October 15, 1983
T. S. Eriksson and C. G. Granqvist, "Infrared optical properties of electron-beam evaporated silicon oxynitride films," Appl. Opt. 22, 3204-3206 (1983)