OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 22, Iss. 23 — Dec. 1, 1983
  • pp: 3664–3665

Low-loss optical waveguides using plasma-deposited silicon nitride

S. Sriram, W. D. Partlow, and C. S. Liu  »View Author Affiliations


Applied Optics, Vol. 22, Issue 23, pp. 3664-3665 (1983)
http://dx.doi.org/10.1364/AO.22.003664


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No abstract available.

History
Original Manuscript: September 26, 1983
Published: December 1, 1983

Citation
S. Sriram, W. D. Partlow, and C. S. Liu, "Low-loss optical waveguides using plasma-deposited silicon nitride," Appl. Opt. 22, 3664-3665 (1983)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-22-23-3664


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References

  1. J. R. Hollahan, R. S. Rosier, “Plasma Deposition of Inorganic thin films,” in Thin Film Processes, J. L. Vossen, W. Kern, Eds. (Academic, New York, 1978). [CrossRef]
  2. E. P. G. T. van de Ven, Solid State Technol. 24, No. 4, 167 (1981).
  3. W. Stutius, W. Streifer, Appl. Opt. 16, 3218 (1977). [CrossRef] [PubMed]
  4. P. K. Tien, Appl. Opt. 10, 2395 (1971). [CrossRef] [PubMed]

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