Ion polishing with the aid of a planarizing film
Applied Optics, Vol. 22, Issue 8, pp. 1165-1167 (1983)
http://dx.doi.org/10.1364/AO.22.001165
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Abstract
An ion polishing technique employing a planarizing film in conjunction with ion-beam erosion at the planarizing angle was used to remove surface irregularities associated with conventional polishing of optical surfaces. By maintaining a planar surface throughout the erosion process, nonuniform erosion resulting from faceting, redeposition, and ion reflection is eliminated. Smooth surfaces on fused quartz are obtained by erosion of a planarizing film of photoresist at an angle of 60°. The method is applicable to a wide variety of materials and may be useful for removing the surface roughness limitation on the laser-induced damage threshold of optical surfaces.
© 1983 Optical Society of America
Citation
Leo F. Johnson and K. A. Ingersoll, "Ion polishing with the aid of a planarizing film," Appl. Opt. 22, 1165-1167 (1983)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-22-8-1165
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