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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 22, Iss. 8 — Apr. 15, 1983
  • pp: 1247–1250

Substrate parameter determination for thin film spectrophotometric measurement correction

M. Matzeu and A. Panatta  »View Author Affiliations


Applied Optics, Vol. 22, Issue 8, pp. 1247-1250 (1983)
http://dx.doi.org/10.1364/AO.22.001247


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Abstract

A method of obtaining accurate values for the optical parameters of thin film substrates is described. Calculations for reflected and transmitted fluxes in substrate sets are developed allowing for double reflection. A simple procedure to fit measurements is also illustrated. Values for substrate parameters are extracted and used to correct for substrate influence in thin film spectrophotometric measurements. Corrected thin film measurements and data calculated with obtained optical constants are compared.

© 1983 Optical Society of America

History
Original Manuscript: August 16, 1982
Published: April 15, 1983

Citation
M. Matzeu and A. Panatta, "Substrate parameter determination for thin film spectrophotometric measurement correction," Appl. Opt. 22, 1247-1250 (1983)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-22-8-1247


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References

  1. J. P. Marton, M. Schlesinger, J. Appl. Phys. 40, 4529 (1969). [CrossRef]
  2. G. Baldini, L. Rigaldi, J. Opt. Soc. Am. 60, 495 (1970). [CrossRef]
  3. A. Panatta, M. Matzeu, unpublished.
  4. F. Abelès, in Advanced Optical Techniques, A. C. S. van Heel, Ed. (North-Holland, Amsterdam, 1967).
  5. H. L. Alder, E. R. Roessler, Introduction to Probability and Statistics (Freeman, San Francisco, 1964).

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