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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 23, Iss. 12 — Jun. 15, 1984
  • pp: 1904_1–1906

Implementation of the Abeles method for thin-film refractive-index measurement with transparent substrates

Mauro Gibson and Jaime Frejlich  »View Author Affiliations


Applied Optics, Vol. 23, Issue 12, pp. 1904_1-1906 (1984)
http://dx.doi.org/10.1364/AO.23.1904_1


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No abstract available.

History
Original Manuscript: December 12, 1983
Published: June 15, 1984

Citation
Mauro Gibson and Jaime Frejlich, "Implementation of the Abeles method for thin-film refractive-index measurement with transparent substrates," Appl. Opt. 23, 1904_1-1906 (1984)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-23-12-1904_1


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References

  1. F. Abelès, “La dètermination de l’indice et de l’epaineur des couches minces transparentes,” J. Phys. Radium 11, 310 (1950). [CrossRef]
  2. M. Hacskaylo, “Determination of the Refractive Index of Thin Dielectric Films,” J. Opt. Soc. Am. 54, 198 (1964). [CrossRef]
  3. W. K. Burns, A. B. Lee, “Effect of Thin-Film Thickness on Abelès-Type Index Measurements,” J. Opt. Soc. Am. 64, 108 (1974). [CrossRef]
  4. A. C. Traub, H. Osterberg, “Brewster Angle Apparatus for Thin Film Index Measurements,” J. Opt. Soc. Am. 47, 62 (1957). [CrossRef]
  5. A. R. Reisinger, H. B. Morris, K. L. Lawley, “Alternative to Ellipsometry for Characterizing Transparent Planar Thin Films,” Opt. Eng. 20, 111 (1981). [CrossRef]
  6. Kodak Micro Resist 747, Publication No. P-306 (1975).
  7. L. I. Maissel, R. Glang, Eds., Handbook of Thin Film Technology (McGraw-Hill, New York, 1970), p. 7–26.
  8. For electron beam deposition of amorphous SiO2 at λ = 5500 Å as reported by G. Hass, M. H. Francombe, R. W. Hoffman, Eds., Physics of Thin Films (Academic, New York, 1975), Vol. 8, p. 29.
  9. M. Françon, Progress in Microscopy (Row, Paterson, & Elmsford, New York, 1961), Chap. 6.

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