OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 23, Iss. 12 — Jun. 15, 1984
  • pp: 1937–1939

Zero reflection from a dielectric film on metal substrate at oblique angles of incidence

H. Kitajima, K. Fujita, and H. Cizmic  »View Author Affiliations


Applied Optics, Vol. 23, Issue 12, pp. 1937-1939 (1984)
http://dx.doi.org/10.1364/AO.23.001937


View Full Text Article

Enhanced HTML    Acrobat PDF (310 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

This paper aims to clarify the conditions in which zero reflection from a dielectric film on metal substrate at oblique angles of incidence takes place. The numerical examples with experimental data show that the light absorption characteristics strongly depend on the film thickness. Therefore, it is useful to observe the oblique-incidence reflectance during the film deposition process for rapid and precise calibration of a thickness monitor.

© 1984 Optical Society of America

History
Original Manuscript: February 13, 1984
Published: June 15, 1984

Citation
H. Kitajima, K. Fujita, and H. Cizmic, "Zero reflection from a dielectric film on metal substrate at oblique angles of incidence," Appl. Opt. 23, 1937-1939 (1984)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-23-12-1937


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. H. Ishino, in Technical Digest, International Conference on Integrated Optics and Optical Fiber Communication (Tokyo, 1983), p. 292.
  2. J. Warner, “Faraday Optical Isolator/Gyrator Design in Planar Dielectric Waveguide Form,” IEEE Trans. Microwave Theory Tech. MTT-21, 769 (1973). [CrossRef]
  3. D. F. Horne, Optical Production Technology (Hilger, Bristol, England, 1983), p. 319.
  4. P. K. Tien, R. Ulrich, R. J. Martin, “Modes of Propagating Waves in Thin Deposited Semiconductor Films,” Appl. Phys. Lett. 10, 291 (1969). [CrossRef]
  5. H. Kitajima, K. Hieda, Y. Suematsu, “Thickness Measurement of Ultrathin Films on Metal Substrates Using ATR,” Appl. Opt. 19, 3106 (1980). [CrossRef] [PubMed]
  6. K. C. Park, “The Extreme Values of Reflectivity and the Conditions for Zero Reflection from Thin Dielectric Films on Metal,” Appl. Opt. 3, 877 (1964). [CrossRef]
  7. H. Kitajima, K. Hieda, Y. Suematsu, “Optimum Conditions in the Attenuated Total Reflection Technique,” Appl. Opt. 20, 1005 (1981). [CrossRef] [PubMed]
  8. Y. Suematsu, Y. Sasaki, H. Noda, E. Asai, M. Hakuta, “Measurements of Refractive Index and Film Thickness of Glass Films by Use of Propagation Constants,” Trans. IECE Jpn. 55-C, 98 (1972).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited