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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 23, Iss. 18 — Sep. 15, 1984
  • pp: 3214–3220

Diffraction characteristics of photoresist surface-relief gratings

M. G. Moharam, T. K. Gaylord, G. T. Sincerbox, H. Werlich, and B. Yung  »View Author Affiliations


Applied Optics, Vol. 23, Issue 18, pp. 3214-3220 (1984)
http://dx.doi.org/10.1364/AO.23.003214


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Abstract

Theoretical results from rigorous coupled-wave analysis are compared with experimental diffraction characteristics for holographically formed dielectric photoresist surface-relief gratings with deep grooves (greater than a grating period) and high diffraction efficiency (>85%). The angular selectivity (at a fixed wavelength) and the wavelength selectivity (at a fixed angle of incidence) are presented for both TE and TM incident polarizations. Modeling the gratings as a surface-relief modulated half-space and using rigorous coupled-wave analysis are shown to produce good general agreement with the experimentally measured diffraction characteristics.

© 1984 Optical Society of America

History
Original Manuscript: February 14, 1984
Published: September 15, 1984

Citation
M. G. Moharam, T. K. Gaylord, G. T. Sincerbox, H. Werlich, and B. Yung, "Diffraction characteristics of photoresist surface-relief gratings," Appl. Opt. 23, 3214-3220 (1984)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-23-18-3214

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