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Applied Optics

Applied Optics


  • Vol. 23, Iss. 3 — Feb. 1, 1984
  • pp: 504–507

Fabrication of high numerical aperture zone plates using deep ultraviolet lithography

K. Kodate, H. Takenaka, and T. Kamiya  »View Author Affiliations

Applied Optics, Vol. 23, Issue 3, pp. 504-507 (1984)

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Linear zone plates with a minimum linewidth of 0.69 μm are fabricated by electron-beam writing and deep UV lithographic techniques. The focusing characteristics are examined for laser beams at 0.633 and 0.86 μm in wavelength. A focal length of 200 m, minimum spot size of 1.0 μm, and a numerical aperture of 0.42 are obtained at λ = 0.633 μm. Possible applications of the present technology to the fabrication of miniaturized focusing elements for opto-electronics are discussed.

© 1984 Optical Society of America

Original Manuscript: September 2, 1983
Published: February 1, 1984

K. Kodate, H. Takenaka, and T. Kamiya, "Fabrication of high numerical aperture zone plates using deep ultraviolet lithography," Appl. Opt. 23, 504-507 (1984)

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