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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 23, Iss. 4 — Feb. 15, 1984
  • pp: 576–583

Gratings for metrology and process control. 2: Thin film thickness measurement

Geraldo F. Mendes, Lucila Cescato, and Jaime Frejlich  »View Author Affiliations


Applied Optics, Vol. 23, Issue 4, pp. 576-583 (1984)
http://dx.doi.org/10.1364/AO.23.000576


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Abstract

A method of measuring thin film thickness is described, based on a previous paper where the authors analyzed a graphical means for grating modulation calculation. Metallic or dielectric films on any substrate may be measured, and precision was shown to be comparable with that achieved ellipsometrically at least in the 300–1500-Å thickness range. The method is non-contact and destructive: the grating is recorded on the film. Measurements are simple, requiring a low-power He–Ne laser and a photodetector, and may be carried out at a distance from the sample. Experimental results are presented for three types of sample, including measurements by reflection and transmission.

© 1984 Optical Society of America

History
Original Manuscript: October 27, 1983
Published: February 15, 1984

Citation
Geraldo F. Mendes, Lucila Cescato, and Jaime Frejlich, "Gratings for metrology and process control. 2: Thin film thickness measurement," Appl. Opt. 23, 576-583 (1984)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-23-4-576

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