In-situ calibration technique for x-ray films
Applied Optics, Vol. 23, Issue 5, pp. 762-766 (1984)
http://dx.doi.org/10.1364/AO.23.000762
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Abstract
An in situ relative intensity calibration technique for x-ray films is described. This is based on film exposure measurements of an x-ray spectrum transmitted through a step-wedge absorption filter. As an example, characteristic curves for Kodak SC5 film have been obtained. The technique was used in the study of laser-produced plasmas.
© 1984 Optical Society of America
Citation
Daniel Pasini, Andrew Ng, and A. J. Barnard, "In-situ calibration technique for x-ray films," Appl. Opt. 23, 762-766 (1984)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-23-5-762
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