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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 24, Iss. 12 — Jun. 15, 1985
  • pp: 1784–1787

Novel V-groove structures on silicon

S. Sriram and E. P. Supertzi  »View Author Affiliations


Applied Optics, Vol. 24, Issue 12, pp. 1784-1787 (1985)
http://dx.doi.org/10.1364/AO.24.001784


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Abstract

A novel etch process on silicon has been developed that consists of a conventional anisotropic etch process followed by stripping the protective oxide layer and etching the substrate once again in the anisotropic etch solution. As a result micron size patterns have been generated from a starting pattern size of 7 μm. These micron size patterns appear to have (111) sidewalls that can be used as templates for the graphoepitaxial process. We are currently exploring the possibility of generating submicron patterns using 2-μm size starting patterns.

© 1985 Optical Society of America

History
Original Manuscript: January 12, 1985
Published: June 15, 1985

Citation
S. Sriram and E. P. Supertzi, "Novel V-groove structures on silicon," Appl. Opt. 24, 1784-1787 (1985)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-24-12-1784

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