Off-axis grating lenses and astigmatic grating lenses, designed for semiconductor laser wavelengths, have been fabricated by an electron-beam (EB) exposure system. High N.A. off-axis grating lenses with near diffraction-limited operation were obtained. Grating lenses with a complex function, such as astigmatic lenses, are also available by EB lithography.
© 1985 Optical Society of America.
Gen-ichi Hatakoshi and Kenya Goto, "Grating lenses for the semiconductor laser wavelength," Appl. Opt. 24, 4307-4311 (1985)