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Applied Optics

Applied Optics


  • Vol. 24, Iss. 24 — Dec. 15, 1985
  • pp: 4307–4311

Grating lenses for the semiconductor laser wavelength

Gen-ichi Hatakoshi and Kenya Goto  »View Author Affiliations

Applied Optics, Vol. 24, Issue 24, pp. 4307-4311 (1985)

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Off-axis grating lenses and astigmatic grating lenses, designed for semiconductor laser wavelengths, have been fabricated by an electron-beam (EB) exposure system. High N.A. off-axis grating lenses with near-diffraction-limited operation were obtained. Grating lenses with a complex function, such as astigmatic lenses, are also available by EB lithography.

© 1985 Optical Society of America

Original Manuscript: August 13, 1984
Published: December 15, 1985

Gen-ichi Hatakoshi and Kenya Goto, "Grating lenses for the semiconductor laser wavelength," Appl. Opt. 24, 4307-4311 (1985)

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