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Applied Optics

Applied Optics


  • Vol. 24, Iss. 4 — Feb. 15, 1985
  • pp: 486–489

Properties of TiO2 and SiO2 thin films deposited using ion assisted deposition

John R. McNeil, G. A. Al-Jumaily, K. C. Jungling, and A. C. Barron  »View Author Affiliations

Applied Optics, Vol. 24, Issue 4, pp. 486-489 (1985)

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TiO2 and SiO2 films deposited using ion assisted deposition are investigated as a function of ion energy and current density. Optical constants, possible ion source contaminants, and optical scatter are examined for samples deposited at ambient (∼75°C) and elevated (∼250°C) substrate temperatures.

© 1985 Optical Society of America

Original Manuscript: June 21, 1984
Published: February 15, 1985

John R. McNeil, G. A. Al-Jumaily, K. C. Jungling, and A. C. Barron, "Properties of TiO2 and SiO2 thin films deposited using ion assisted deposition," Appl. Opt. 24, 486-489 (1985)

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  1. J. R. McNeil, A. C. Barron, S. R. Wilson, W. C. Herrmann, “Ion-Assisted Deposition of Optical Thin Films: Low Energy vs High Energy Bombardment,” Appl. Opt. 23, 559 (1984). [CrossRef]
  2. W. C. Herrmann, J. R. McNeil, “Ion Beam Applications for Optical Coating,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 101 (1982).
  3. T. H. Allen, “Properties of Ion Assisted Deposited Silica and Titania Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 93 (1982).
  4. P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983). [CrossRef] [PubMed]
  5. P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983). [CrossRef]
  6. J. R. McNeil, L. J. Wei, G. A. Al-Jumaily, S. Shakier, J. K. McIver, “Surface Smoothing Effects of Thin Film Deposition?,” Appl. Opt. 24, 480 (1985). [CrossRef] [PubMed]
  7. R. Kelly, H. M. Naguib, in Atomic Collision Phenomena in Solids, D. W. Palmer et al., Eds. (North-Holland, Amsterdam, 1970), p. 172.

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