OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 25, Iss. 12 — Jun. 15, 1986
  • pp: 1958–1961

Analytical expression for the standing wave intensity in photoresist

Chris A. Mack  »View Author Affiliations


Applied Optics, Vol. 25, Issue 12, pp. 1958-1961 (1986)
http://dx.doi.org/10.1364/AO.25.001958


View Full Text Article

Enhanced HTML    Acrobat PDF (384 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

When a thin dielectric film placed between two semi-infinite media is irradiated with monochromatic plane waves, a standing wave is produced in the film. An analytical expression for the standing wave intensity within the film is derived. This expression is then expanded to include the effects of other dielectric films on either side of the film or an inhomogeneous film. Applications of these expressions are given for photolithographic modeling.

© 1986 Optical Society of America

History
Original Manuscript: December 16, 1985
Published: June 15, 1986

Citation
Chris A. Mack, "Analytical expression for the standing wave intensity in photoresist," Appl. Opt. 25, 1958-1961 (1986)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-25-12-1958


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. S. Middlehoek, “Projection Masking, Thin Photoresist Layers and Interference Effects,” IBM J. Res. Dev. 14, 117 (Mar.1970).
  2. J. E. Korka, “Standing Waves in Photoresists,” Appl. Opt. 9, 969 (1970).
  3. D. F. Ilten, K. V. Patel, “Standing Wave Effects in Photoresist Exposure,” Image Technol. 9 (Feb/Mar.1971).
  4. D. W. Widmann, “Quantitative Evaluation of Photoresist Patterns in the 1-μm Range,” Appl. Opt. 14, 931 (1975).
  5. F. H. Dill, “Optical Lithography,” Trans. Electron Dev. ED-22, 440 (July1975).
  6. B. F. Griffing, P. R. West, “Contrast Enhanced Lithography,” Solid State Tech. 28, 152 (May1985).
  7. C. A. Mack, “PROLITH: A Comprehensive Optical Lithography Model,” Proc. Soc. Photo-Opt. Instrum. Eng. 538, 207 (1985).
  8. P. H. Berning, “Theory and Calculations of Optical Thin Films,” Physics of Thin Films, George Hass, Ed. (Academic, New York, 1963), pp. 69–121.

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

Figures

Fig. 1 Fig. 2 Fig. 3
 

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited