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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 25, Iss. 12 — Jun. 15, 1986
  • pp: 1958–1961

Analytical expression for the standing wave intensity in photoresist

Chris A. Mack  »View Author Affiliations


Applied Optics, Vol. 25, Issue 12, pp. 1958-1961 (1986)
http://dx.doi.org/10.1364/AO.25.001958


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Abstract

When a thin dielectric film placed between two semi-infinite media is irradiated with monochromatic plane waves, a standing wave is produced in the film. An analytical expression for the standing wave intensity within the film is derived. This expression is then expanded to include the effects of other dielectric films on either side of the film or an inhomogeneous film. Applications of these expressions are given for photolithographic modeling.

© 1986 Optical Society of America

History
Original Manuscript: December 16, 1985
Published: June 15, 1986

Citation
Chris A. Mack, "Analytical expression for the standing wave intensity in photoresist," Appl. Opt. 25, 1958-1961 (1986)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-25-12-1958

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