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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 25, Iss. 12 — Jun. 15, 1986
  • pp: 1973–1976

Ion assisted deposition of optical and protective coatings for heavy metal fluoride glass

James J. McNally, Ghanim A. Al-Jumaily, John R. McNeil, and B. Bendow  »View Author Affiliations


Applied Optics, Vol. 25, Issue 12, pp. 1973-1976 (1986)
http://dx.doi.org/10.1364/AO.25.001973


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Abstract

Heavy metal fluoride glass materials are attractive for optical applications in the near UV through IR wavelength regions. However, many compositions are relatively soft and hygroscopic and possess low softening temperature (250–300°C). We have applied ion assisted deposition (IAD) techniques to deposit MgF2, SiO2, and A12O3/SiO2 thin filmstructures on fluorideglass substrates at ambient substrate temperature (~100°C). The coatings deposited using IAD improve the environmental durability of the fluoride glass and appear to have reasonably good optical characteristics; without application of IAD, the deposited coatingsare not durable and have poor adhesion.

© 1986 Optical Society of America

History
Original Manuscript: February 8, 1986
Published: June 15, 1986

Citation
James J. McNally, Ghanim A. Al-Jumaily, John R. McNeil, and B. Bendow, "Ion assisted deposition of optical and protective coatings for heavy metal fluoride glass," Appl. Opt. 25, 1973-1976 (1986)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-25-12-1973


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References

  1. D. C. Tran, G. H. Sigel, B. Bendow, “Heavy Metal Fluoride Glasses and Fibers: A Review,” IEEE/OSA J. Lightwave Technol. 5, 566 (1984). [CrossRef]
  2. C. J. Simmons, S. A. Azali, J. H. Simmons, “Chemical Durability Studies of Heavy Metal Fluride Glasses,” in Second International Symposium on Halide Glasses, Troy, NY (1983).
  3. W. C. Herrmann, J. R. McNeil, “Ion Beam Applications for Optical Coatings,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 101 (1982).
  4. P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983). [CrossRef]
  5. P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983). [CrossRef] [PubMed]
  6. T. H. Allen, “Ion Assisted Deposition of Titania and Silica Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 93 (1982).
  7. R. D. Bland, G. J. Kominiak, D. M. Mattox, “Effect of Ion Bombardment During Deposition of Thick Metal and Ceramic Deposits,” J. Vac. Sci. Technol. 11, 671 (1974). [CrossRef]
  8. J. J. McNally, G. A. Al-Jumaily, J. R. McNeil, “Ion-Assisted Deposition of Ta2O5 and A12O3 Thin Films,” J. Vac. Sci. Technol. A, A5 (1986), in press.
  9. J. J. McNally, G. A. Al-Jumaily, S. R. Wilson, J. R. McNeil, “Ion-Beam-Assisted Deposition of Optical Thin Films—Recent Results,” Proc. Soc. Photo-Opt. Instrum. Eng. 540, 479 (1985).
  10. G. A. Al-Jumaily, J. J. McNally, J. R. McNeil, “Effect of Ion Assisted Deposition on Optical Scatter and Surface Microstructure of Thin Films,” J. Vac. Sci. Technol. A3, 651 (1985).
  11. J. R. McNeil, G. A. Al-Jumaily, K. C. Jungling, A. C. Barron, “Properties of TiO2 and SiO2 Thin Films Deposited Using Ion Assisted Deposition,” Appl. Opt. 24, 486 (1985). [CrossRef] [PubMed]
  12. J. R. McNeil, A. C. Barron, S. R. Wilson, W. C. Herrmann, “Ion Assisted Deposition of Optical Thin Films: Low Energy vs High Energy Bombardment,” Appl. Opt. 23, 552 (1984). [CrossRef] [PubMed]
  13. J. J. McNally, G. A. Al-Jumaily, J. R. McNeil, “Properties of Ta2O5 and A12O3 Thin Films Deposited Using Ion Assisted Deposition,” to be published.

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