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Applied Optics

Applied Optics


  • Vol. 25, Iss. 18 — Sep. 15, 1986
  • pp: 3152–3158

Analysis of measurement accuracy in sinusoidal phase modulating interferometry

Osami Sasaki and Hirokazu Okazaki  »View Author Affiliations

Applied Optics, Vol. 25, Issue 18, pp. 3152-3158 (1986)

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A theoretical analysis of the measurement accuracy in sinusoidal phase modulating (SPM) interferometry is presented. The measurement accuracy is dependent on multiplicative and additive noise. The characteristics of SPM interferometry in the presence of this noise are made clear. Theoretical results show clearly that SPM interferometry has a high measurement accuracy of the order of 1 nm.

© 1986 Optical Society of America

Original Manuscript: March 18, 1986
Published: September 15, 1986

Osami Sasaki and Hirokazu Okazaki, "Analysis of measurement accuracy in sinusoidal phase modulating interferometry," Appl. Opt. 25, 3152-3158 (1986)

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  1. O. Sasaki, H. Okazaki, “Sinusoidal Phase Modulating Interferometry for Surface Profile Measurement,” Appl. Opt. 25, (1986), same issue. [CrossRef] [PubMed]
  2. R. Crane, “Interference Phase Measurement,” Appl. Opt. 8, 538 (1969).
  3. J. H. Bruning, D. R. Herriott, J. E. Gallagher, D. P. Rosenfeld, A. D. White, D. J. Brangaccio, “Digital Wavefront Measuring Interferometer for Testing Optical Surfaces and Lenses,” Appl. Opt. 13, 2693 (1974). [CrossRef] [PubMed]

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