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Applied Optics

Applied Optics


  • Vol. 25, Iss. 20 — Oct. 15, 1986
  • pp: 3645–3652

Development of optical monitor for control of thin-film deposition

I. Powell, J. C. M. Zwinkels, and A. R. Robertson  »View Author Affiliations

Applied Optics, Vol. 25, Issue 20, pp. 3645-3652 (1986)

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The design of a multichannel optical monitor for transmittance measurements of thin-film coatings during deposition is described. The system comprises a light source and one or more spectrum analyzers each incorporating a prism monochromator and a 256-element photodiode array detector. This multiple-channel design, in conjunction with an HP 1000 computer and data acquisition period of 100 ms, enables the coating uniformity to be precisely monitored and controlled. High-system throughput has been achieved with a large numerical aperture (f/1.5), while retaining excellent spectral resolution over the 350–1100-nm wavelength range. Experimental measurements indicate a practical resolution equal to the detector-limited resolution, a wavelength reproducibility of 0.1 nm at 400 nm and 0.6 nm at 700 nm, and a photometric accuracy and precision of ~1 and ±0.3%, respectively. The problem of unequal energy distribution across the spectrum is handled by optical rather than the usual electronic compensation.

© 1986 Optical Society of America

Original Manuscript: May 27, 1986
Published: October 15, 1986

I. Powell, J. C. M. Zwinkels, and A. R. Robertson, "Development of optical monitor for control of thin-film deposition," Appl. Opt. 25, 3645-3652 (1986)

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  1. B. Vidal, A. Fornier, E. Pelletier, “Wideband Optical Monitoring of Nonquarterwave Multilayer Filters,” Appl. Opt. 18, 3851 (1979). [PubMed]
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