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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 25, Iss. 21 — Nov. 1, 1986
  • pp: 3909–3915

In situ and air index measurements: influence of the deposition parameters on the shift of TiO2/SiO2 Fabry-Perot filters

B. Schmitt, J. P. Borgogno, G. Albrand, and E. Pelletier  »View Author Affiliations


Applied Optics, Vol. 25, Issue 21, pp. 3909-3915 (1986)
http://dx.doi.org/10.1364/AO.25.003909


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Abstract

We measure the refractive index of thin films of TiO2 and SiO2 for given deposition parameters. Two complementary methods are used. The first is a postdeposition technique which uses the measurements of reflectance and transmittance in air. The second, in contrast, makes use of in situ measurements (under vacuum and during the actual deposition of the layer). The differences between the values deduced from the two methods can be explained by the amount of atmospheric moisture adsorbed by films. One tries to minimize these shifts for the two materials by choosing deposition parameters. The difficulties come from the absorption losses which must be as small as possible. We use the measured refractive indices of individual layers to give good numerical prediction of the wavelength shift (observed during the admittance of air after deposition in the vacuum chamber) of the transmittance peak of multidielectric Fabry-Perot filters.

© 1986 Optical Society of America

History
Original Manuscript: March 24, 1986
Published: November 1, 1986

Citation
B. Schmitt, J. P. Borgogno, G. Albrand, and E. Pelletier, "In situ and air index measurements: influence of the deposition parameters on the shift of TiO2/SiO2 Fabry-Perot filters," Appl. Opt. 25, 3909-3915 (1986)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-25-21-3909


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References

  1. P. Bousquet, E. Pelletier, “Optical Thin Film Monitoring: Recent Advances and Limitations,” Thin Solid Films 77, 165 (1981). [CrossRef]
  2. J. P. Borgogno et al., “Refractive Index and Inhomogeneity of Thin Films,” Appl. Opt. 23, 3567 (1984). [CrossRef] [PubMed]
  3. H. K. Pulker, G. Paesold, E. Ritter, “Refractive Indices of TiO2 Films Produced by Reactive Evaporation of Various Titanium–Oxygen Phases,” Appl. Opt. 15, 2986 (1976); J. P. Borgogno, P. Bousquet, F. Flory, B. Lazarides, E. Pelletier, P. Roche, “Inhomogeneity in Films: Limitations of the Accuracy of Optical Monitoring of Thin Films,” Appl. Opt. 20, 90 (1981). [CrossRef] [PubMed]
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  6. F. Flory, B. Schmitt, E. Pelletier, H. A. Macleod, “Interpretation of Wide Band Scans of Growing Optical Thin Films in Terms of Layer Microstructure,” Proc. Soc. Photo-Opt. Instrum. Eng. 401, 109 (1983).
  7. H. A. Macleod, “Turning Value Monitoring of Narrow-Band All Dielectric Thin-Film Optical Filters,” Opt. Acta 19, 1 (1972). [CrossRef]
  8. E. Pelletier, “Monitoring of Optical Thin Films During Deposition,” Proc. Soc. Photo-Opt. Instrum. Eng. 401, 74 (1983).
  9. J. P. Borgogno, B. Lazarides, E. Pelletier, “Automatic Determination of the Optical Constants of Inhomogeneous Thin Films,” Appl. Opt. 21, 4020 (1982). [CrossRef] [PubMed]
  10. J. P. Borgogno, B. Lazarides, P. Roche, “An Improved Method for the Determination of the Extinction Coefficient of Thin Film Materials,” Thin Solid Films 102, 209 (1983). [CrossRef]

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