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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 26, Iss. 7 — Apr. 1, 1987
  • pp: 1175–1182

Stress in optical waveguides. 2: Fibers

P. K. Bachmann, W. Hermann, H. Wehr, and D. U. Wiechert  »View Author Affiliations


Applied Optics, Vol. 26, Issue 7, pp. 1175-1182 (1987)
http://dx.doi.org/10.1364/AO.26.001175


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Abstract

The stress properties of GeO2- and F-doped optical fibers drawn in different conditions have been investigated. The results are in excellent agreement with calculated data based on a generalized theoretical model. For constant drawing forces the influence on the stress profiles was found to be independent of drawing speed and temperature. The total observed stress is the sum of preform stress and drawing-induced stress.

© 1987 Optical Society of America

History
Original Manuscript: November 20, 1986
Published: April 1, 1987

Citation
P. K. Bachmann, W. Hermann, H. Wehr, and D. U. Wiechert, "Stress in optical waveguides. 2: Fibers," Appl. Opt. 26, 1175-1182 (1987)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-26-7-1175


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References

  1. P. K. Bachmann, W. Hermann, H. Wehr, D. U. Wiechert, “Stress in Optical Waveguides. 1: Preforms,” Appl. Opt. 25, 1093 (1986). [CrossRef] [PubMed]
  2. S. Timoshenko, J. N. Goodier, Theory of Elasticity (McGraw-Hill, New York, 1970).
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  4. W. Primak, D. Post, “Photoelastic Constants of Vitreous Silicon and Its Elastic Coefficient at Refractive Index,” J. Appl. Phys. 30, 779 (1959). [CrossRef]
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  9. P. Geittner, D. Kuppers, H. Lydtin, “Low-Loss Optical Fibres Prepared by Plasma Activated CVD,” Appl. Phys. Lett. 28, 645 (1976). [CrossRef]
  10. P. K. Bachmann, “Review on Plasma Deposition Applications: Preparation of Optical Waveguides,” Pure Appl. Chem. 57, 1299 (1985). [CrossRef]
  11. P. K. Bachmann, P. Geittner, H. Lydtin, “Progress in the PCVD Process,” in Technical Digest, Conference on Optical Fiber Communication (Optical Society of America, Washington, DC, 1986), paper WA1.
  12. Y. Y. Huang, H. Sarkar, “Relationship Between Composition, Density and Refractive Index for Germania Silica Glasses,” J. Non-Cryst. Solids 27, 29 (1978). [CrossRef]
  13. S. E. Miller, A. G. Chynoweth, Optical Telecommunications (Academic, New York, 1979).
  14. P. K. Bachmann, T. P. M. Meeuwsen, D. U. Wiechert, “Thermal Expansion Coefficients of Doped and Undoped Silica Prepared by Means of PCVD,” J. Lightwave Techn. (1987), to be published.
  15. A. Muhlich, K. Rau, N. Treber, “Preparation of Fluorine Doped Silica Preforms by Plasma Chemical Technique,” in Technical Digest, Third European Conference on Optical Communications, Munich (1977), p. 10.

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