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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 27, Iss. 14 — Jul. 15, 1988
  • pp: 2841–2846

Amorphous silicon carbide coatings for extreme ultraviolet optics

J. B. Kortright and David L. Windt  »View Author Affiliations


Applied Optics, Vol. 27, Issue 14, pp. 2841-2846 (1988)
http://dx.doi.org/10.1364/AO.27.002841


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Abstract

Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 Å were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.

© 1988 Optical Society of America

History
Original Manuscript: September 17, 1987
Published: July 15, 1988

Citation
J. B. Kortright and David L. Windt, "Amorphous silicon carbide coatings for extreme ultraviolet optics," Appl. Opt. 27, 2841-2846 (1988)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-27-14-2841


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References

  1. M. M. Kelly, J. B. West, D. E. Lloyd, “Reflectance of Silicon Carbide in the Vacuum Ultraviolet,” J. Phys. D 14, 401 (1981). [CrossRef]
  2. S. Mrowka, P. Jelinsky, S. Bowyer, G. Sanger, W. J. Choyke, “Reflectivity of Silicon Carbide in the Extreme Ultraviolet,” Proc. Soc. Photo-Opt. Instrum. Eng. 597, 160 (1986).
  3. D. L. Windt, B. Bach, “Ion Beam Deposited Silicon Carbide on Glass Optics and Replica Gratings,” Appl. Opt. 23, 3047 (1984). [CrossRef] [PubMed]
  4. Sputtering targets were obtained from Pure Tech, Inc., Ossining, NY.
  5. D. L. Windt, “The Optical Properties of 21 Thin Film Materials in the 10 eV to 500 eV Photon Energy Region,” Ph.D. Thesis, U. Colorado (1987) (unpublished).
  6. D. L. Windt et al., “Optical Constants for Thin Films of C, Diamond, Al, Si, and CVD SiC from 24 Å to 1216 Å,” Appl. Opt. 27, 279 (1988). [CrossRef] [PubMed]
  7. D. L. Windt, W. Cash, “The Soft X-ray/EUV Calibration Facility at the University of Colorado,” Proc. Soc. Photo-Opt. Instrum. Eng. 689, 167 (1986).
  8. B. L. Henke, P. Lee, T. J. Tanaka, R. L. Shimabukuro, B. K. Fujikawa, “The Atomic Scattering Factor, f1 + if2, for 94 Elements and for the 100 to 2000 eV Photon Energy Region,” AIP Conf. Proc. 75, 340 (1981). [CrossRef]
  9. J. Osantowski, data presented at the Glancing Incidence Optics Fabrication Workshop, hosted by the Optics Branch of the Goddard Space Flight Center, Annapolis, MD, 1–4 Apr. 1985.
  10. V. Rehn, J. L. Stanford, V. O. Jones, W. J. Choyke, “Optical Constants and Reflectivity of Type 6H SiC in the Range 4–25 eV,” in Proceedings, Thirteenth International Conference on Physics Semiconductors, Roma, Italy (1976), p. 985.
  11. E. D. Palik, in Handbook of Optical Constants of Solids, E. D. Palik, Ed. (Academic, Orlando, 1985).
  12. A complete discussion of the experimental uncertainty in the derived optical constants can be found in Refs. 5 and 6.
  13. The grating was ruled by Hyperfine, Inc., Boulder, CO.
  14. J. T. Cox, G. Hass, J. B. Ramsey, W. R. Hunter, “Reflectance and Optical Constants of Evaporated Osmium in the Vacuum Ultraviolet from 300 Å to 2000 Å,” J. Opt. Soc. Am. 63, 435 (1973). [CrossRef]
  15. J. B. Kortright, P. Plag, R. C. C. Perera, P. L. Cowan, D. W. Lindle, B. Karlin, “Multilayer-Coated Mirrors as Power Filters in Synchrotron Radiation Beamlines,” Nucl. Inst. Methods 4266, 452 (1988).

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