A phenomenon is described in which the size of the exit-slit image of the entrance slit is influenced by the angle at which an echelle grating is used. The phenomenon becomes significant only for large deviations from Littrow conditions. A mathematical treatment and experimental results are presented to show that proper exploitation of the effect results in simultaneous improvements in bandpass, range, and intensity for an echelle spectrometer.
© 1988 Optical Society of America
Original Manuscript: November 20, 1987
Published: September 15, 1988
Ronald Masters, Chunming Hsiech, and Harry L. Pardue, "Advantages of an off-Littrow mounting of an echelle grating," Appl. Opt. 27, 3895-3897 (1988)