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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 27, Iss. 18 — Sep. 15, 1988
  • pp: 3895–3897

Advantages of an off-Littrow mounting of an echelle grating

Ronald Masters, Chunming Hsiech, and Harry L. Pardue  »View Author Affiliations


Applied Optics, Vol. 27, Issue 18, pp. 3895-3897 (1988)
http://dx.doi.org/10.1364/AO.27.003895


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Abstract

A phenomenon is described in which the size of the exit-slit image of the entrance slit is influenced by the angle at which an echelle grating is used. The phenomenon becomes significant only for large deviations from Littrow conditions. A mathematical treatment and experimental results are presented to show that proper exploitation of the effect results in simultaneous improvements in bandpass, range, and intensity for an echelle spectrometer.

© 1988 Optical Society of America

History
Original Manuscript: November 20, 1987
Published: September 15, 1988

Citation
Ronald Masters, Chunming Hsiech, and Harry L. Pardue, "Advantages of an off-Littrow mounting of an echelle grating," Appl. Opt. 27, 3895-3897 (1988)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-27-18-3895

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