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Applied Optics

Applied Optics


  • Vol. 27, Iss. 23 — Dec. 1, 1988
  • pp: 4913–4919

Absorption and exposure in positive photoresist

Chris A. Mack  »View Author Affiliations

Applied Optics, Vol. 27, Issue 23, pp. 4913-4919 (1988)

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A review of the theory of absorption on microscopic and macroscopic levels is given. This theory is then applied to the absorption of UV light by diazo-type positive photoresist during exposure. A formal treatment of the properties of polychromatic light is given. Using these analyses, the effects of polychromatic exposure of a photoresist are derived. Finally, experimental verification of Beer’s law and determination of the exposure quantum efficiency of a particular photoresist is given.

© 1988 Optical Society of America

Original Manuscript: December 31, 1987
Published: December 1, 1988

Chris A. Mack, "Absorption and exposure in positive photoresist," Appl. Opt. 27, 4913-4919 (1988)

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  11. Reichhold Chemicals, Inc., Warren, NJ 07060.
  12. Fairmount Chemical Co., Inc., Newark, NJ 07105.

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