Absorption and exposure in positive photoresist
Applied Optics, Vol. 27, Issue 23, pp. 4913-4919 (1988)
http://dx.doi.org/10.1364/AO.27.004913
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Abstract
A review of the theory of absorption on microscopic and macroscopic levels is given. This theory is then applied to the absorption of UV light by diazo-type positive photoresist during exposure. A formal treatment of the properties of polychromatic light is given. Using these analyses, the effects of polychromatic exposure of a photoresist are derived. Finally, experimental verification of Beer’s law and determination of the exposure quantum efficiency of a particular photoresist is given.
Citation
Chris A. Mack, "Absorption and exposure in positive photoresist," Appl. Opt. 27, 4913-4919 (1988)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-27-23-4913
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