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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 27, Iss. 23 — Dec. 1, 1988
  • pp: 4920–4924

Optimizing deposition parameters of electron beam evaporated TiO2 films

Hans W. Lehmann and K. Frick  »View Author Affiliations


Applied Optics, Vol. 27, Issue 23, pp. 4920-4924 (1988)
http://dx.doi.org/10.1364/AO.27.004920


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Abstract

A study of the major deposition parameters including source material, oxygen partial pressure, substrate temperature, and deposition rate affecting the optical quality of electron beam evaporated TiO2 films is presented. After careful optimization of these parameters it is possible to reproducibly deposit TiO2 films from TiO2 source material mixed with 5% CeO2 at an oxygen partial pressure of 5 × 10−5 Torr, a substrate temperature of 320°C, and a deposition rate of 2 Å/s.

© 1988 Optical Society of America

History
Original Manuscript: February 29, 1988
Published: December 1, 1988

Citation
Hans W. Lehmann and K. Frick, "Optimizing deposition parameters of electron beam evaporated TiO2 films," Appl. Opt. 27, 4920-4924 (1988)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-27-23-4920

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