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Applied Optics

Applied Optics


  • Vol. 27, Iss. 23 — Dec. 1, 1988
  • pp: 4920–4924

Optimizing deposition parameters of electron beam evaporated TiO2 films

Hans W. Lehmann and K. Frick  »View Author Affiliations

Applied Optics, Vol. 27, Issue 23, pp. 4920-4924 (1988)

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A study of the major deposition parameters including source material, oxygen partial pressure, substrate temperature, and deposition rate affecting the optical quality of electron beam evaporated TiO2 films is presented. After careful optimization of these parameters it is possible to reproducibly deposit TiO2 films from TiO2 source material mixed with 5% CeO2 at an oxygen partial pressure of 5 × 10−5 Torr, a substrate temperature of 320°C, and a deposition rate of 2 Å/s.

© 1988 Optical Society of America

Original Manuscript: February 29, 1988
Published: December 1, 1988

Hans W. Lehmann and K. Frick, "Optimizing deposition parameters of electron beam evaporated TiO2 films," Appl. Opt. 27, 4920-4924 (1988)

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  1. E. Ritter, “Deposition of Oxide Films by Reactive Evaporation,” J. Vac. Sci. Technol. 3, 225 (1966). [CrossRef]
  2. H. K. Pulker, G. Paesold, E. Ritter, “Refractive Indices of TiO2 Films Produced by Reactive Evaporation of Various Titanium–Oxygen Phases,” Appl. Opt. 15, 2986 (1976). [CrossRef] [PubMed]
  3. J. R. McNeil, A. C. Barron, S. R. Wilson, W. C. Herrmann, “Ion-Assisted Deposition of Optical Thin Films: Low Energy vs High Energy Bombardment,” Appl. Opt. 23, 552 (1984). [CrossRef] [PubMed]
  4. F. Aschwanden, M. T. Gale, P. Kieffer, K. Knop, “Single-Chip Color Camera Using a Frame-Transfer CCD,” IEEE Trans. Electron Dev. ED-32, 1396 (1985). [CrossRef]
  5. K. Frick, H. W. Lehmann, “Annealing of TiO2 Films Monitored by Ellipsometry at Elevated Temperature,” to be published.
  6. M. T. Gale, K. Frick, H. W. Lehmann, “In-Situ Monitoring of Thin Films During Evaporation,” in Proceedings, International Congress of Optical Science Engineering, Hamburg (1988), paper 1019–12.
  7. ELPO A1 and ELPO A113 distributed by ELPO AG, Wetzikon, Switzerland.
  8. H. K. Pulker, Coatings on Glass (Elsevier, Amsterdam, 1984), p. 377.
  9. B. J. Curtis, M. T. Gale, H. W. Lehmann, H. Schütz, R. Widmer, “Fabrication of Mosaic Color Filters by Dry-Etching Dielectric Stacks,” J. Vac. Sci. Technol. A 4, 70 (1986). [CrossRef]

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