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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 27, Iss. 3 — Feb. 1, 1988
  • pp: 541–546

In situ microviscoelastic measurements by polarization-interferometric monitoring of indentation depth

Valorie S. Williams, Alan L. Landesman, Roland V. Shack, Daniel Vukobratovich, and Bharat Bhushan  »View Author Affiliations


Applied Optics, Vol. 27, Issue 3, pp. 541-546 (1988)
http://dx.doi.org/10.1364/AO.27.000541


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Abstract

A new type of computer-controlled instrument has been developed to measure microviscoelastic properties of thin materials. It can independently control and measure indentation loads and depths in situ revealing information about material creep and relaxation. Sample and indenter positions are measured with a specially designed polarization interferometer. Indenter loadings can be varied between 0.5 and 10 g and held constant to ±41 mg. The resulting indentation depths can be measured in situ to ±1.2 nm. The load required to maintain constant indentation depths from 0.1 to 5.0 μm can be measured in situ to ±3.3 mg and the depth held constant to ±15 nm.

© 1988 Optical Society of America

History
Original Manuscript: November 7, 1986
Published: February 1, 1988

Citation
Valorie S. Williams, Alan L. Landesman, Roland V. Shack, Daniel Vukobratovich, and Bharat Bhushan, "In situ microviscoelastic measurements by polarization-interferometric monitoring of indentation depth," Appl. Opt. 27, 541-546 (1988)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-27-3-541


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References

  1. P. E. Wierenga, A. J. J. Franken, “Ultramicroindentation Apparatus for the Mechanical Characterization of Thin Films,” J. Appl. Phys. 55, 4244 (1984). [CrossRef]
  2. For further details, see V. S. Williams, “In situ Microviscoelastic Measurements by Polarization Interferometry,” Master’s Thesis, U. Arizona (1988).
  3. R. Brian Hooker, H. E. Morrow, R. V. Shack, “The Polarization Interferometer,” AF33613-70-C-1413 (May1971).

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