Abstract

Bragg reflector fabrication techniques on SiO₂–Si₃N₄–SiO₂ rib waveguides on Si are developed and optimized. Wafer preparation, holographic exposure, and pattern transfer techniques necessary to obtain uniform low-loss gratings have been developed. Phase drifts due to the effect of air density fluctuations during holographic exposure of the amplitude division interference type were studied and removed. These improvements enabled high quality Bragg reflectors over 5 cm (2 in.) in diameter to be reproducibly fabricated.

© 1988 Optical Society of America

Low loss Bragg reflectors on SiO₂–Si₃N₄–SiO₂ rib waveguides

H. J. Lee, C. H. Henry, R. F. Kazarinov, and K. J. Orlowsky
Appl. Opt. 26(13) 2618-2620 (1987)

Low loss Si₃N₄–SiO₂ optical waveguides on Si

C. H. Henry, R. F. Kazarinov, H. J. Lee, K. J. Orlowsky, and L. E. Katz
Appl. Opt. 26(13) 2621-2624 (1987)

Fabrication of Si₃N₄/SiO₂ tiered resonant nanopillars with nickel caps arrays: application for optochemical sensing

V. Canalejas-Tejero, A. L. Hernández, R. Casquel, S. A. Quintero, M. F. Laguna, and M. Holgado
Opt. Mater. Express 8(4) 1082-1090 (2018)

Hollow Bragg waveguides fabricated by controlled buckling of Si/SiO₂ multilayers

E. Epp, N. Ponnampalam, W. Newman, B. Drobot, J. N. McMullin, A. F. Meldrum, and R. G. DeCorby
Opt. Express 18(24) 24917-24925 (2010)

Fabrication of a self-aligned multi-waveguide-layer passive Si₃N₄/SiO₂ photonic integrated circuit for a 3-D optical phased array device

Dachuan Wu, Kevin Owen, Bowen Yu, and Yasha Yi
Opt. Mater. Express 14(1) 13-21 (2024)