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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 27, Iss. 7 — Apr. 1, 1988
  • pp: 1281–1284

Technique for monolithic fabrication of microlens arrays

Zoran D. Popovic, Robert A. Sprague, and G. A. Neville Connell  »View Author Affiliations


Applied Optics, Vol. 27, Issue 7, pp. 1281-1284 (1988)
http://dx.doi.org/10.1364/AO.27.001281


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Abstract

A microlens fabrication process is described which can be used in applications requiring integration of optical elements (lenses) and microcircuits. The process is fully compatible with IC fabrication technology and uses commercially available IC processing materials. The obtained microlenses are of excellent quality and basically show diffraction-limited resolution with ~1-μm spot size. Extensions of the process to production of nonspherical lenses and use of alternative material packages are also discussed.

© 1988 Optical Society of America

History
Original Manuscript: July 27, 1987
Published: April 1, 1988

Citation
Zoran D. Popovic, Robert A. Sprague, and G. A. Neville Connell, "Technique for monolithic fabrication of microlens arrays," Appl. Opt. 27, 1281-1284 (1988)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-27-7-1281


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References

  1. I. N. Ozerov, V. M. Petrov, V. a. Shishkina, V. M. Shor, “Shaping the Contours of Dies for Manufacturing Lens Arrays Having Spherical Elements,” Sov. J. Opt. Technol. 48, 49 (1981).
  2. M. Oikawa, K. Iga, T. Sanada, N. Yamamoto, K. Nishizawa, “Array of Distributed-Index Planar Micro-Lenses Prepared from Ion Exchange Technique,” Jpn. J. Appl. Phys. 20, L296 (1981). [CrossRef]
  3. N. F. Borrelli, D. L. Morse, R. H. Bellman, W. L. Morgan, “Photolytic Technique for Producing Microlenses in Photosensitive Glass,” Appl. Opt. 24, 2520 (1985). [CrossRef] [PubMed]
  4. O. Wada, S. Yamakoshi, M. Abe, Y. Nishitani, T. Sakurai, “High Radiance InGaAsP/InP LED’s for Optical Communication Systems at 1.2–1.3μm,” IEEE J. Quantum Electron. QE-17, 174 (1981). [CrossRef]
  5. Y. Ishihara, K. Tanigaki, “A High Photosensitivity IL-CCD Image Sensor with Monolithic Resin Lens Array,” in Proceedings, International Electron Devices Meeting, Washington, DC (Sept. 1983), pp. 497–500.
  6. J. F. Oliver, C. Huh, S. G. Mason, “Resistance to Spreading of Liquids by Sharp Edges,” J. Colloid Interface Sci. 59, 568 (1977). [CrossRef]
  7. R. Allen, M. Foster, Y. Yen, “Deep U.V. Hardening of Positive Photoresist Patterns,” J. Electrochem. Soc. 129, 1379 (1982). [CrossRef]

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