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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 27, Iss. 8 — Apr. 15, 1988
  • pp: 1377–1380

Phase-shifted quarter micron holographic gratings by selective image reversal of photoresist

Winston K. Chan, John Chung, and Robert J. Contolini  »View Author Affiliations


Applied Optics, Vol. 27, Issue 8, pp. 1377-1380 (1988)
http://dx.doi.org/10.1364/AO.27.001377


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No abstract available.

History
Original Manuscript: October 19, 1987
Published: April 15, 1988

Citation
Winston K. Chan, John Chung, and Robert J. Contolini, "Phase-shifted quarter micron holographic gratings by selective image reversal of photoresist," Appl. Opt. 27, 1377-1380 (1988)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-27-8-1377


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References

  1. H. A. Haus, C. V. Shank, “Antisymmetric Taper of Distributed Feedback Lasers,” IEEE J. Quantum Electron. QE-12, 532 (1976). [CrossRef]
  2. K. Utaka, S. Akiba, K. Sakai, Y. Matsushima, “Analysis of Quarter-Wave-Shifted DFB Laser,” Electron. Lett. 20, 326 (1984). [CrossRef]
  3. K. Sekartedjo, N. Eda, K. Furuya, Y. Suematsu, F. Koyama, T. Tanbun-ek, “1.5 μm Phase-Shifted DFB Lasers for Single-Mode Operation,” Electron. Lett. 20, 80 (1984). [CrossRef]
  4. F. Koyama, Y. Suematsu, K. Kojima, K. Furuya, “1.5 μm Phase Adjusted Active Distributed Reflector Laser for Complete Dynamic Single-Mode Operation,” Electron. Lett. 20, 391 (1984). [CrossRef]
  5. K. Utaka, S. Akiba, K. Sakai, Y. Matsushima, “λ/4-Shifted InGaAsP/InP DFB Lasers by Simultaneous Holographic Exposure of Positive and Negative Photoresists,” Electron. Lett. 20, 1008 (1984). [CrossRef]
  6. H. Moritz, “Optical Single Layer Lift-Off Process,” IEEE Trans. Electron Devices ED-32, 672 (1985). [CrossRef]
  7. H. Klose, R. Sigush, W. Arden, “Image Reversal of Positive Photoresist: Characterization and Modeling,” IEEE Trans. Electron Devices ED-32, 1654 (1985). [CrossRef]
  8. B. D. Cantos, R. D. Remba, “An Improved Technique for 1/4 Micrometer Gate Length GaAs MESFET Fabrication by Optical Lithography,” Proc. Soc. Photo-Opt. Instrum. Eng. 773, 61 (1987).

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