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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 27, Iss. 8 — Apr. 15, 1988
  • pp: 1499–1502

Grazing incidence reflectance of SiC films produced by plasma-assisted chemical vapor deposition

Ritva A. M. Keski-Kuha, John F. Osantowski, Albert R. Toft, and William D. Partlow  »View Author Affiliations


Applied Optics, Vol. 27, Issue 8, pp. 1499-1502 (1988)
http://dx.doi.org/10.1364/AO.27.001499


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Abstract

The grazing incidence reflectance of silicon carbide films produced by plasma-assisted chemical vapor deposition has been evaluated in the spectral region from 256 to 1216 Å. The results show that reflectivities higher than conventional coatings can be obtained on coatings deposited both on silicon wafers and quartz substrates. Potential application of silicon carbide films for EUV astronomical instruments will be discussed.

© 1988 Optical Society of America

History
Original Manuscript: August 18, 1987
Published: April 15, 1988

Citation
Ritva A. M. Keski-Kuha, John F. Osantowski, Albert R. Toft, and William D. Partlow, "Grazing incidence reflectance of SiC films produced by plasma-assisted chemical vapor deposition," Appl. Opt. 27, 1499-1502 (1988)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-27-8-1499

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