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Applied Optics

Applied Optics


  • Vol. 27, Iss. 9 — May. 1, 1988
  • pp: 1840–1843

Performance comparison of positive branch unstable resonator cavities for excimer lasers

Terrence J. McKee and Gary T. Boyd  »View Author Affiliations

Applied Optics, Vol. 27, Issue 9, pp. 1840-1843 (1988)

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The near- and far-field performance of three practical positive branch unstable resonator designs was compared for a commercial excimer laser operating on ArF and KrF. Atmospheric attenuation at 193 and 248 nm was measured.

© 1988 Optical Society of America

Original Manuscript: September 8, 1987
Published: May 1, 1988

Terrence J. McKee and Gary T. Boyd, "Performance comparison of positive branch unstable resonator cavities for excimer lasers," Appl. Opt. 27, 1840-1843 (1988)

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  1. A. E. Siegman, “Unstable Optical Resonators,” Appl. Opt. 13, 353 (1974). [CrossRef] [PubMed]
  2. T. J. McKee, B. P. Stoicheff, S. C. Wallace, “Diffraction-Limited KrF and XeF Lasers with a Negative-Branch Unstable Resonator,” Appl. Phys. Lett. 30, 278 (1977). [CrossRef]
  3. D. L. Barker, T. R. Loree, “Improved Beam Quality in Double Discharge Excimer Lasers,” Appl. Opt. 16, 1792, (1977). [CrossRef] [PubMed]
  4. D. J. James, T. J. McKee, W. Skrlac, “High Magnification Unstable Resonator Excimer Laser,” IEEE J. Quantum Electron. QE-15, 335 (1979). [CrossRef]
  5. M. Born, E. Wolf, Principles of Optics (Pergamon, Oxford, 1970), 331. For zero absorption, the peak etalon reflectivity Rp becomes Rp = (4r)/(l + r)2, where r is the surface reflectance. For an uncoated fused silica etalon, the peak reflectivity is 15.2% at 248 nm and 17.5% at 193 nm.
  6. Ref. 5, 161.
  7. B. K. Deka, P. E. Dyer, “Mode Control and Performance Studies of Pulsed Unstable Resonator HF/DF Laser,” IEEE J. Quantum Electron. QE-14, 661 (1978). [CrossRef]

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