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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 28, Iss. 16 — Aug. 15, 1989
  • pp: 3434–3442

Reflection micro-Fresnel lenses and their use in an integrated focus sensor

Teruhiro Shiono, Masatoshi Kitagawa, Kentaro Setsune, and Tsuneo Mitsuyu  »View Author Affiliations


Applied Optics, Vol. 28, Issue 16, pp. 3434-3442 (1989)
http://dx.doi.org/10.1364/AO.28.003434


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Abstract

Blazed reflection micro-Fresnel lenses and their use in an integrated focus sensor are proposed. Theoretical analysis indicates that the optical characteristics of reflection Fresnel lenses can be improved compared with a conventional transmission micro-Fresnel lens. These reflection Fresnel lenses were fabricated using electron-beam lithography and exhibited the diffraction-limited focusing characteristics with 71% high efficiency. The focus sensor has a folded optical path and includes a beam splitter integrated with thin film components, such as a reflection elliptical Fresnel lens and a quadrant photodetector. The reflection elliptical Fresnel lens in the focus sensor exhibiting excellent astigmatic characteristics agreed with the theoretical results, and the focus error signal was detected. This sensor can be developed as the optical head of an optical disk system.

© 1989 Optical Society of America

History
Original Manuscript: November 10, 1988
Published: August 15, 1989

Citation
Teruhiro Shiono, Masatoshi Kitagawa, Kentaro Setsune, and Tsuneo Mitsuyu, "Reflection micro-Fresnel lenses and their use in an integrated focus sensor," Appl. Opt. 28, 3434-3442 (1989)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-28-16-3434


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References

  1. H. Nishihara, T. Suhara, “Micro Fresnel Lenses,” Prog. Opt. 24, 3–37 (1987).
  2. T. Shiono, K. Setsune, O. Yamazaki, K. Wasa, “Computer-Controlled Electron-Beam Writing System for Thin Film Micro-Optics,” J. Vac. Sci. Technol. B 5, 33–36 (1987). [CrossRef]
  3. T. Shiono, K. Setsune, O. Yamazaki, K. Wasa, “Rectangular-Apertured Micro-Fresnel Lens Arrays Fabricated by Electron-Beam Lithography,” Appl. Opt. 26, 587–591 (1987). [CrossRef] [PubMed]
  4. T. Shiono, K. Setsune, O. Yamazaki, “Elliptical Micro-Fresnel Lenses Fabricated by Electron-Beam Writing Technique,” Trans. IEICE Jpn. J70-C, 1044–1051 (1987).
  5. K. Ozawa, N. Takagi, K. Hiranaka, S. Yanagisawa, K. Asama, “Contact-Type Linear Sensor Using Amorphous Si Diode Array,” Jpn. J. Appl. Phys. Suppl. 22, 457–460 (1982).
  6. R. Petit, Ed., Electromagnetic Theory of Gratings (Springer-Verlag, Berlin, 1980). [CrossRef]
  7. M. Born, E. Wolf, Principles of Optics (Pergamon, Oxford, 1970).

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