A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 μm are presented.
© 1989 Optical Society of America
Clemens Rensch, Stefan Hell, Manfred v. Schickfus, and Siegfried Hunklinger, "Laser scanner for direct writing lithography," Appl. Opt. 28, 3754-3758 (1989)