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Applied Optics

Applied Optics


  • Vol. 28, Iss. 17 — Sep. 1, 1989
  • pp: 3754–3758

Laser scanner for direct writing lithography

Clemens Rensch, Stefan Hell, Manfred v. Schickfus, and Siegfried Hunklinger  »View Author Affiliations

Applied Optics, Vol. 28, Issue 17, pp. 3754-3758 (1989)

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A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 μm are presented.

© 1989 Optical Society of America

Original Manuscript: April 20, 1988
Published: September 1, 1989

Clemens Rensch, Stefan Hell, Manfred v. Schickfus, and Siegfried Hunklinger, "Laser scanner for direct writing lithography," Appl. Opt. 28, 3754-3758 (1989)

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