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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 28, Iss. 17 — Sep. 1, 1989
  • pp: 3754–3758

Laser scanner for direct writing lithography

Clemens Rensch, Stefan Hell, Manfred v. Schickfus, and Siegfried Hunklinger  »View Author Affiliations


Applied Optics, Vol. 28, Issue 17, pp. 3754-3758 (1989)
http://dx.doi.org/10.1364/AO.28.003754


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Abstract

A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 μm are presented.

© 1989 Optical Society of America

History
Original Manuscript: April 20, 1988
Published: September 1, 1989

Citation
Clemens Rensch, Stefan Hell, Manfred v. Schickfus, and Siegfried Hunklinger, "Laser scanner for direct writing lithography," Appl. Opt. 28, 3754-3758 (1989)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-28-17-3754


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References

  1. I. Brodie, J. J. Muray, The Physics of Microfabricaiion (Plenum Press, New York, 1982).
  2. “Laser Beams Speed Up Reticle Writing,” Electronics 10, 40–00 (1985).
  3. H. Hardie, G. Weiss, S. Hunklinger, F. Baumann, “Elastic Properties of Amorphous Water at Low Temperature,” Z. Phys. B 65, 291–000 (1987). [CrossRef]
  4. F. F. Y. Wang, R. Newmann, “Materials Processing Theory and Practices,” in Fine Line Lithography, Vol. 1 (North-Holland, Amsterdam1980).
  5. M. Born, E. Wolf, Principles of Optics (Pergamon Press, New York, 1980).
  6. L. Beiser, “Generalized Gradient Deflector and Consequences of Scan of Convergent Light,” J. Opt. Soc. Am. 57, 923–931 (1967). [CrossRef]
  7. K. H. Muller, Verfahren zur Festlegung einer Koordinate auf einer Oberflache eines Festkorpers und Vorrichtung zur Durch-fuhrung eines solchen Verfahrens, Patent application VPA 83P 1457 DE, Siemens AG (1983).
  8. AZ Photoresist Products.
  9. H. Ulrich, R. W. Wijnaendts-van-Resandt, C. Rensch, W. Ehrensperger, “Direct Writing Laser Lithography for Production of Microstructures,” Microcircuit Eng. 87, 89 (1987).

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