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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 28, Iss. 17 — Sep. 1, 1989
  • pp: 3775–3778

Beam monitoring system for simultaneous measurement of near and far field patterns in high repetition rate KrF lasers

Takashi Yagi, Y. Matsumi, K. Ohta, Jehuda Bachar, H. Saito, M. Obara, and T. Fujioka  »View Author Affiliations


Applied Optics, Vol. 28, Issue 17, pp. 3775-3778 (1989)
http://dx.doi.org/10.1364/AO.28.003775


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Abstract

A computer-controlled beam monitoring system for KrF excimer lasers was developed for simultaneous measurement of near and far field patterns and pointing stability of the laser beam at a 250 Hz repetition rate. The system and results obtained are described.

© 1989 Optical Society of America

History
Original Manuscript: June 28, 1988
Published: September 1, 1989

Citation
Takashi Yagi, Y. Matsumi, K. Ohta, Jehuda Bachar, H. Saito, M. Obara, and T. Fujioka, "Beam monitoring system for simultaneous measurement of near and far field patterns in high repetition rate KrF lasers," Appl. Opt. 28, 3775-3778 (1989)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-28-17-3775


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References

  1. J. D. Gibbs, “Pyroelectric Laser Beam Diagnostic System,” Proc. Soc. Photo-Opt. Instrum. Eng. 739, 203–215 (1987).
  2. D. M. Sough, O. Y. Kwon, “Phase-Shifting, Pulsed-Laser Interferometer,” Proc. Soc. Photo-Opt. Instrum. Eng. 739, 174–180 (1987).
  3. EG&G Reticon, Application Notes 121, Sunnyvale, CA 94086. This value is calculated from the saturation light level of 0.5 μJ/ cm2 at a wavelength of 2870 K tungsten with a HA-11 filter. Using the relative responsivity of 0.78 and 0.2057 for this light source and for 250-nm wavelength, respectively, the saturation light level at 250 nm gives 0.19 μJ/cm2.
  4. T. Yagi, Y. Matsumi, K. Ohta, H. Saito, M. Obara, T. Fujioka, “A Diagnostic System for an Excimer Laser Beam,” in Proceedings, Seventh International Symposium on Gas Flow & Chemical Lasers, Vienna, (1988).

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