Beam monitoring system for simultaneous measurement of near and far field patterns in high repetition rate KrF lasers
Applied Optics, Vol. 28, Issue 17, pp. 3775-3778 (1989)
http://dx.doi.org/10.1364/AO.28.003775
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Abstract
A computer-controlled beam monitoring system for KrF excimer lasers was developed for simultaneous measurement of near and far field patterns and pointing stability of the laser beam at a 250 Hz repetition rate. The system and results obtained are described.
© 1989 Optical Society of America
Citation
Takashi Yagi, Y. Matsumi, K. Ohta, Jehuda Bachar, H. Saito, M. Obara, and T. Fujioka, "Beam monitoring system for simultaneous measurement of near and far field patterns in high repetition rate KrF lasers," Appl. Opt. 28, 3775-3778 (1989)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-28-17-3775
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