Characterization of vanadium oxide optical thin films by x-ray diffractometry
Applied Optics, Vol. 28, Issue 4, pp. 713-716 (1989)
http://dx.doi.org/10.1364/AO.28.000713
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Abstract
Thin-film x-ray diffractometry with Seemann-Bohlin focusing provides enhanced sensitivity to the microstructures of optical thin films. Results on vanadium oxide films are presented.
© 1989 Optical Society of America
Citation
Elizabeth E. Chain, "Characterization of vanadium oxide optical thin films by x-ray diffractometry," Appl. Opt. 28, 713-716 (1989)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-28-4-713
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