A contact-type line image sensor using a semiinsulating Pb2CrO5 thin film deposited on a glass substrate by an electron beam evaporation deposition technique is described. The sensor has a simple structure and a high scanning rate of 1 ms/line. An individual sensor element responds to light modulated at 100-kHz frequency, so a higher scanning rate is expected. A matrix driving method using a simple reading circuit is used to operate a sensor composed of 32 elements at a rate of 8 elements/mm. Some practical results on image reading are demonstrated.
© 1990 Optical Society of America
Shinzo Yoshida and Kohji Toda, "Contact-type line image sensor using Pb2CrO5 thin film," Appl. Opt. 29, 1793-1797 (1990)