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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 13 — May. 1, 1990
  • pp: 1905–1911

Contouring by electronic speckle pattern interferometry employing dual beam illumination

Charles Joenathan, Berthold Pfister, and H. J. Tiziani  »View Author Affiliations


Applied Optics, Vol. 29, Issue 13, pp. 1905-1911 (1990)
http://dx.doi.org/10.1364/AO.29.001905


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Abstract

In this paper we extend and study the method for generating contours of diffuse objects employing a dual beam illumination coupled with electronic speckle pattern interferometry. The sensitivity and the orientation of the contour planes are analyzed. A novel method for tilting the planes of contours and experimental results incorporating phase shifting and fringe analysis are also presented. The theoretical and the experimental results show good agreement.

© 1990 Optical Society of America

History
Original Manuscript: July 24, 1989
Published: May 1, 1990

Citation
Charles Joenathan, Berthold Pfister, and H. J. Tiziani, "Contouring by electronic speckle pattern interferometry employing dual beam illumination," Appl. Opt. 29, 1905-1911 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-13-1905


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References

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  8. A. R. Ganesan, R. S. Sirohi, “New Method of Contouring Using Digital Speckle Pattern Interferometry,” Proc. Soc. Photo-Opt. Inst. Eng. 954, 327–332 (1988).
  9. J. A. Leendertz, “Interferometric Displacement Measurement on Scattering Surfaces Utilizing Speckle Effect,” J. Physics E. 3, 214–218 (1970). [CrossRef]
  10. Y. Y. Hung, “Displacement and Strain Measurement,” in Speckle Metrology, R. K. Erf, Ed. (Springer Verlag, New York, 1975), pp. 51–71.
  11. C. Wykes, “A Theoretical Approach to the Optimization of Electronic Speckle Interferometry with Limited Laser Power,” J. Mod. Opt. 34, 539–554 (1987). [CrossRef]

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