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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 13 — May. 1, 1990
  • pp: 1905–1911

Contouring by electronic speckle pattern interferometry employing dual beam illumination

Charles Joenathan, Berthold Pfister, and H. J. Tiziani  »View Author Affiliations


Applied Optics, Vol. 29, Issue 13, pp. 1905-1911 (1990)
http://dx.doi.org/10.1364/AO.29.001905


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Abstract

In this paper we extend and study the method for generating contours of diffuse objects employing a dual beam illumination coupled with electronic speckle pattern interferometry. The sensitivity and the orientation of the contour planes are analyzed. A novel method for tilting the planes of contours and experimental results incorporating phase shifting and fringe analysis are also presented. The theoretical and the experimental results show good agreement.

© 1990 Optical Society of America

History
Original Manuscript: July 24, 1989
Published: May 1, 1990

Citation
Charles Joenathan, Berthold Pfister, and H. J. Tiziani, "Contouring by electronic speckle pattern interferometry employing dual beam illumination," Appl. Opt. 29, 1905-1911 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-13-1905

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