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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 18 — Jun. 20, 1990
  • pp: 2755–2759

Fabrication of microlenses by laser chemical vapor deposition

Miyuki Kubo and Mitsugu Hanabusa  »View Author Affiliations


Applied Optics, Vol. 29, Issue 18, pp. 2755-2759 (1990)
http://dx.doi.org/10.1364/AO.29.002755


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Abstract

A new laser-based method was developed for fabrication of microlenses on flat quartz plates. In this method, a CO2 laser is used to heat a quartz surface and induce thermal reactions for source gases of SiH4 and NO. Even as-grown silicon oxide deposits have the spherical thickness distribution required for a lens at the center and this useful area can be further increased by wet etching. Microlenses were checked on a Fizeau interferometer for surface accuracy and aberrations. As a demonstration, a 14-μm thick microlens was used for collimating light from an optical fiber.

© 1990 Optical Society of America

History
Original Manuscript: July 27, 1989
Published: June 20, 1990

Citation
Miyuki Kubo and Mitsugu Hanabusa, "Fabrication of microlenses by laser chemical vapor deposition," Appl. Opt. 29, 2755-2759 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-18-2755


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References

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  9. A. Sugimura, Y. Fukuda, M. Hanabusa, “Selective Area Deposition of Silicon-nitride and Silicon-oxide by Laser Chemical Vapor Deposition and Fabrication of Microlenses,” J. Appl. Phys. 62, 3222–3227 (1987). [CrossRef]
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  12. See, for example, M. Hanabusa, “Photoinduced Deposition of Thin Films,” Mater. Sci. Rep. 2, 51–98 (1987). [CrossRef]

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