Current pattern data formats for electron beam lithography are specifically designed to meet the needs of the VLSI industry. As a result, pattern data file size is often the limiting factor in the production of a binary computer generated hologram and not the spatial bandwidth product. This paper explores one alternate pattern data format that facilitates the full utilization of the e-beam machine’s spatial bandwidth product without introducing prohibitive amounts of pattern data. The pattern data format uses two well-established data compression techniques specifically tailored to remove the redundancies present in holographic fringe patterns.
© 1990 Optical Society of America
Robert W. Hawley and Neal C. Gallagher, "Efficient electron beam pattern data format for the production of binary computer generated holograms," Appl. Opt. 29, 216-224 (1990)