A krypton ion laser was used to measure the spectral characteristics of a narrowband multilayer dielectric rejection filter produced by plasma chemical vapor deposition.
© 1990 Optical Society of America
Original Manuscript: September 14, 1989
Published: August 1, 1990
Larry Edmonds, Philip Baumeister, M. Eric Krisl, and Norman Boling, "Spectral characteristics of a narrowband rejection filter," Appl. Opt. 29, 3203-3204 (1990)