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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 25 — Sep. 1, 1990
  • pp: 3694–3698

Peak reflectivity measurements of W/C, Mo/Si, and Mo/B4C multilayer mirrors in the 8–190-Å range using both Kα line and synchrotron radiation

Andrew P. Zwicker, Sean P. Regan, Michael Finkenthal, H. Warren Moos, Ed B. Saloman, Richard Watts, and James R. Roberts  »View Author Affiliations


Applied Optics, Vol. 29, Issue 25, pp. 3694-3698 (1990)
http://dx.doi.org/10.1364/AO.29.003694


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Abstract

Peak reflectivity measurements of W/C, Mo/Si, and Mo/B4C multilayer mirrors have been performed using line and synchrotron radiation in the 8–190 Å wavelength range. Short wavelength measurements using a line source were corrected for nonmonochromatic and divergent incident radiation. Reflectivities of Mo/Si mirrors, measured with synchrotron radiation, ranged from 25 to 44% but decreased significantly around the Si absorption edge. Mo/B4C multilayer mirrors were measured that had peak reflectivities from 10 to 25% between 90 and 200 Å and bandpasses as small as 3 Å.

© 1990 Optical Society of America

History
Original Manuscript: January 12, 1990
Published: September 1, 1990

Citation
Andrew P. Zwicker, Sean P. Regan, Michael Finkenthal, H. Warren Moos, Ed B. Saloman, Richard Watts, and James R. Roberts, "Peak reflectivity measurements of W/C, Mo/Si, and Mo/B4C multilayer mirrors in the 8–190-Å range using both Kα line and synchrotron radiation," Appl. Opt. 29, 3694-3698 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-25-3694

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