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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 27 — Sep. 20, 1990
  • pp: 3880–3882

Polyimide optical waveguides fabricated with electron beam lithography

M. J. Rooks, H. V. Roussell, and L. M. Johnson  »View Author Affiliations


Applied Optics, Vol. 29, Issue 27, pp. 3880-3882 (1990)
http://dx.doi.org/10.1364/AO.29.003880


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Abstract

Fabrication of PMMA clad polyimide waveguides by electron beam lithography creates very smooth sidewalls allowing production of narrow low loss waveguides on planar substrates.

© 1990 Optical Society of America

History
Original Manuscript: December 4, 1989
Published: September 20, 1990

Citation
M. J. Rooks, H. V. Roussell, and L. M. Johnson, "Polyimide optical waveguides fabricated with electron beam lithography," Appl. Opt. 29, 3880-3882 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-27-3880

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