Polyimide optical waveguides fabricated with electron beam lithography
Applied Optics, Vol. 29, Issue 27, pp. 3880-3882 (1990)
http://dx.doi.org/10.1364/AO.29.003880
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Abstract
Fabrication of PMMA clad polyimide waveguides by electron beam lithography creates very smooth sidewalls allowing production of narrow low loss waveguides on planar substrates.
© 1990 Optical Society of America
Citation
M. J. Rooks, H. V. Roussell, and L. M. Johnson, "Polyimide optical waveguides fabricated with electron beam lithography," Appl. Opt. 29, 3880-3882 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-27-3880
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