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Applied Optics

Applied Optics


  • Vol. 29, Iss. 27 — Sep. 20, 1990
  • pp: 3880–3882

Polyimide optical waveguides fabricated with electron beam lithography

M. J. Rooks, H. V. Roussell, and L. M. Johnson  »View Author Affiliations

Applied Optics, Vol. 29, Issue 27, pp. 3880-3882 (1990)

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Fabrication of PMMA clad polyimide waveguides by electron beam lithography creates very smooth sidewalls allowing production of narrow low loss waveguides on planar substrates.

© 1990 Optical Society of America

Original Manuscript: December 4, 1989
Published: September 20, 1990

M. J. Rooks, H. V. Roussell, and L. M. Johnson, "Polyimide optical waveguides fabricated with electron beam lithography," Appl. Opt. 29, 3880-3882 (1990)

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  1. R. Selvaraj, H. T. Lin, J. F. McDonald, “Integrated Optical Waveguides in Polyimide for Wafer Scale Integration,” IEEE/OSA J. Lightwave Technol. LT-6, 1034–1044 (1988). [CrossRef]
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