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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 27 — Sep. 20, 1990
  • pp: 3891–3899

Scaling rules for nonlinear thin film optical waveguides

Marie Fontaine  »View Author Affiliations


Applied Optics, Vol. 29, Issue 27, pp. 3891-3899 (1990)
http://dx.doi.org/10.1364/AO.29.003891


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Abstract

A mode power measure is applied to characterize nonlinear thin film optical waveguides in an approach analogous to that of Chelkowski and Chrostowski. Together with the normalized film thickness and the asymmetry coefficient, it allows us to get a concise overview of the waveguiding properties at a given power. For self-focusing film, we discuss the design conditions under which the degree of asymmetry significantly affects the waveguiding properties.

© 1990 Optical Society of America

History
Original Manuscript: November 1, 1989
Published: September 20, 1990

Citation
Marie Fontaine, "Scaling rules for nonlinear thin film optical waveguides," Appl. Opt. 29, 3891-3899 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-27-3891

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