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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 27 — Sep. 20, 1990
  • pp: 3934–3937

Flat microwave-powered ultraviolet source

Tetsuo Ono and Seiichi Murayama  »View Author Affiliations


Applied Optics, Vol. 29, Issue 27, pp. 3934-3937 (1990)
http://dx.doi.org/10.1364/AO.29.003934


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Abstract

A microwave-powered ultraviolet source capable of covering an area as large as a 150-mm Si wafer is developed. Fifteen low pressure mercury discharge lamps are arrayed in a flat microwave cavity. The Hg 254-nm irradiance on the surface 1 cm from the lamps is 120 mW/cm2 at a microwave power of 1200 W. This UV source is used for photoresist removal. Low pressure cadmium lamps, which have the Cd 229-nm irradiance of 13.9 mW/cm2 at 1 cm for a 500-W input, are also investigated.

© 1990 Optical Society of America

History
Original Manuscript: August 9, 1989
Published: September 20, 1990

Citation
Tetsuo Ono and Seiichi Murayama, "Flat microwave-powered ultraviolet source," Appl. Opt. 29, 3934-3937 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-27-3934


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References

  1. D. A. Bolon, C. O. Kunz, “Ultraviolet Depolymerization of Photoresist Polymers,” Polymer Eng. Sci. 12, 109–111 (1972). [CrossRef]
  2. D. A. Bolon, “Method for Removing Photoresist from Substrate,” U.S. Patent3,890,176 (17June1975).
  3. C. H. Brekel, P. J. Severin, “Control of the Deposition of Silicon Nitride Layers by 2537 Å Radiation,” J. Electrochem. Soc. 119, 372–376 (1972). [CrossRef]
  4. J. W. Peters, F. L. Gebhart, T. C. Hall, “Low Temperature Photo-CVD Silicon Nitride: Properties and Applications,” Solid State Technol. 23, 121–126 (1980).
  5. G. Brandli, “A New Source of Intense Short-Wave Ultraviolet Radiation,” Brown Boveri Rev. 5, 202–205 (1975).
  6. P. G. Wilkinson, Y. Tanaka, “New Xenon-Light Source for the Vacuum Ultraviolet,” J. Opt. Soc. Am. 45, 344–349 (1955). [CrossRef]
  7. D. M. Spero, B. J. Eastlund, M. G. Ury, “Apparatus and Method for Generating Radiation,” U.S. Patent3,872,349 (18Mar.1975); D. M. Spero, B. J. Eastlund, M. G. Ury, “Method and Apparatus for Generating Electromagnetic Radiation,” U.S. Patent3,911,318 (7Oct.1975).
  8. M. G. Ury, J. C. Matthews, C. H. Wood, “New Deep Ultraviolet Source for Microlithography,” Proc. Soc. Photo-Opt. Instrum. Eng. 334, 241–246 (1982).
  9. J. F. Waymouth, Electric Discharge Lamps (MIT Press, Cambridge, MA, 1971), p. 34.

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