Kinoforms manufactured in photoresist by photolithographic techniques using a single, ten-level, grey scale photomask, exposed in a specially designed laser exposure system, are described. Kinoforms designed for uniform as well as for partial Gaussian beam illumination are discussed. The highest measured diffraction efficiency was 55%. Photoresist kinoforms were transferred into quartz substrates by reactive ion etching. The highest measured diffraction efficiency for the resulting all-quartz kinoforms was 53%.
© 1990 Optical Society of America
Original Manuscript: October 27, 1989
Published: October 1, 1990
H. Andersson, Mats Ekberg, Sverker Hård, Stellan Jacobsson, Michael Larsson, and T. Nilsson, "Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluation," Appl. Opt. 29, 4259-4267 (1990)