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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 28 — Oct. 1, 1990
  • pp: 4259–4267

Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluation

H. Andersson, Mats Ekberg, Sverker Hård, Stellan Jacobsson, Michael Larsson, and T. Nilsson  »View Author Affiliations


Applied Optics, Vol. 29, Issue 28, pp. 4259-4267 (1990)
http://dx.doi.org/10.1364/AO.29.004259


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Abstract

Kinoforms manufactured in photoresist by photolithographic techniques using a single, ten-level, grey scale photomask, exposed in a specially designed laser exposure system, are described. Kinoforms designed for uniform as well as for partial Gaussian beam illumination are discussed. The highest measured diffraction efficiency was 55%. Photoresist kinoforms were transferred into quartz substrates by reactive ion etching. The highest measured diffraction efficiency for the resulting all-quartz kinoforms was 53%.

© 1990 Optical Society of America

History
Original Manuscript: October 27, 1989
Published: October 1, 1990

Citation
H. Andersson, Mats Ekberg, Sverker Hård, Stellan Jacobsson, Michael Larsson, and T. Nilsson, "Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluation," Appl. Opt. 29, 4259-4267 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-28-4259

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