OSA's Digital Library

Applied Optics

Applied Optics


  • Vol. 29, Iss. 28 — Oct. 1, 1990
  • pp: 4303–4309

Coatings for optical applications produced by ion beam sputter deposition

Jurgen Becker and Volker Scheuer  »View Author Affiliations

Applied Optics, Vol. 29, Issue 28, pp. 4303-4309 (1990)

View Full Text Article

Enhanced HTML    Acrobat PDF (874 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



Ion beam sputter deposition (IBSD) is a useful technique for producing high performance optical coatings. It is possible with relatively simple methods to get a reasonable deposition rate over a sufficiently large area. However, thin films produced with this coating method had a relatively high amount of contaminants. The contaminants were analyzed by various techniques mainly by total reflection x-ray fluorescence. The influence of the contaminants on the performance of the optical coatings proved to be surprisingly low. Optical properties were investigated, mainly the refractive index, the absorption coefficient at 0.514 μm, the scattering behavior, and the damage threshold against high-power laser pulses at 1.06 μm.

© 1990 Optical Society of America

Original Manuscript: August 4, 1989
Published: October 1, 1990

Jurgen Becker and Volker Scheuer, "Coatings for optical applications produced by ion beam sputter deposition," Appl. Opt. 29, 4303-4309 (1990)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. J. M. E. Harper, “Ion Beam Deposition,” in Thin Film Processes, J. L. Vossen, W. Kern, Eds. (Academic, New York, 1978).
  2. H. R. Kaufman, “Technology of Ion Beam Sources Used in Sputtering,” J. Vac. Sci. Technol. 15, 272–276 (1978). [CrossRef]
  3. H. R. Kaufman, J. M. E. Harper, J. J. Cuomo, “Developments in Broad-Beam, Ion-Source Technology and Applications,” J. Vac. Sci. Technol. 21, 764–767 (1982). [CrossRef]
  4. H. R. Kaufman, J. J. Cuomo, J. M. E. Harper, “Technology and Applications of Broad-Beam Ion Sources Used in Sputtering. Part I. Ion Source Technology,” J. Vac. Sci. Technol. 21, 725–736 (1982). [CrossRef]
  5. J. M. E. Harper, J. J. Cuomo, H. R. Kaufman, “Technology and Applications of Broad-Beam Ion Sources Used in Sputtering. Part II. Applications,” J. Vac. Sci. Technol. 21, 737–756 (1982). [CrossRef]
  6. H. R. Kaufman, “Broad-Beam Ion Sources: Present Status and Future Directions,” J. Vac. Sci. Technol. A 4, 764–771 (1986). [CrossRef]
  7. H. A. Macleod, “Ion Assisted Deposition of Thin Films,” in Proceedings of International Symposium on Trends and New Applications in Thin-Films, Strasbourg, France (1987).
  8. S. E. Barnes, D. C. Grindrod, T. W. Jolly, C. J. Shaw, “The Design of Industrial Systems for Ion Beam Sputter Deposition of Optical Coatings,” in Proceedings, IPAT’87, Brighton (1987).
  9. H. Pulker, “Modern Optical Coating Technologies,” Proc. Soc. Photo-Opt. Instrum. Eng. 1019, 138–147 (1988).
  10. M. Varasi, C. Misiano, L. Lasaponara, “Ion Beam Sputtering Deposition of Optical Thin Films,” in Proceedings, International Ion Engineering Congress, ISIAT’83 and IPAT’83, Kyoto (1983).
  11. Y. Yoneda, T. Horiuchi, “Optical Flats for Use in X-Ray Spectrochemical Microanalysis,” Rev. Sci. Instrum. 42, 1069–1070 (1971). [CrossRef]
  12. H. Aiginger, P. Wobrauschek, “A Method for Quantitative X-Ray Fluorescence Analysis in the Nanogram Region,” Nucl. Instrum. Methods 114, 157–158 (1974). [CrossRef]
  13. P. Wobrauschek, H. Aiginger, “Total-Reflection X-Ray Fluorescence Spectrometric Determination of Elements in Nanogram Amounts,” Anal. Chem. 47, 852–855 (1975). [CrossRef]
  14. P. Wobrauschek, H. Aiginger, “X-Ray Fluorescence Analysis in the ng-Region Using Total Reflection of the Primary Beam,” Spectrochim. Acta Part B 35, 607–614 (1980). [CrossRef]
  15. R.-P. Stossel, A. Prange, “Determination of Trace Elements in Rainwater by Total-Reflection X-Ray Fluorescence,” Anal. Chem. 57, 2880–2885 (1985). [CrossRef]
  16. H. A. Macleod, Thin-Film Optical Filters (Adam Hilger, Bristol, 1986). [CrossRef]
  17. D. P. Arndt et al., “Multiple Determination of the Optical Constants of Thin-Film Coating Materials,” Appl. Opt. 23, 3571–3596 (1984). [CrossRef] [PubMed]
  18. R. E. Klinger, C. K. Carniglia, “Optical and Crystalline Inhomogeneity in Evaporated Zirconia Films,” Appl. Opt. 24, 3184–3187 (1985). [CrossRef] [PubMed]
  19. J. Ebert, TH Hannover, F. R. Germany; private communication (1983).
  20. P. A. Temple, “The Measurement of Absorption in Thin Films by Laser Calorimetry,” Proc. Soc. Photo-Opt. Instrum. Eng. 652, 272–283 (1986).
  21. L. Mattsson, “Light Scattering and Characterization of Thin Films,” Proc. Soc. Photo. Opt. Instrum. Eng. 652, 215–220 (1986).
  22. L. Mattsson, “Total Integrated Scatter Measurement System For Quality Assessment of Coatings on Optical Surfaces,” Proc. Soc. Photo-Opt. Instrum. Eng. 652, 264–271 (1986).
  23. J. M. Elson, H. E. Bennett, J. M. Bennett, “Scattering From Optical Surfaces,” in Applied Optics and Optical Engineering, R. R. Shannon, J. C. Wyant, Eds. (Academic, New York, 1979).
  24. J. M. Bennett, J. M. Elson, J. P. Rahn, “Angle-Resolved Scattering: Comparison of Theory and Experiment,” Proc. Soc. Photo-Opt. Instrum. Eng. 401, 234–246 (1983).
  25. J. M. Elson, J. P. Rahn, J. M. Bennett, “Relationship of the Total Integrated Scattering From Multilayer-Coated Optics to Angle of Incidence, Polarization, Correlation Length, and Roughness Cross-Correlation Properties,” Appl. Opt. 22, 3207–3219 (1983). [CrossRef] [PubMed]
  26. J. M. Elson, J. M. Bennett, “Relation Between the Angular Dependence of Scattering and the Statistical Properties of Optical Surfaces,” J. Opt. Soc. Am. 69, 31–47 (1979). [CrossRef]
  27. W. H. Lowdermilk, D. Milam, “Laser-Induced Surface and Coating Damage,” IEEE J. Quantum Electron. QE-17, 1888–1903 (1981). [CrossRef]
  28. K. H. Guenther et al., “1.06-μm Laser Damage of Thin Film Optical Coatings: A Round-Robin Experiment Involving Various Pulse Lengths and Beam Diameters,” Appl. Opt. 23, 3743–3752 (1984). [CrossRef] [PubMed]
  29. S. C. Seitel, K. H. Guenther, “Toward Standardization in Laser Induced Damage Testing,” Proc. Soc. Photo. Opt. Instrum. Eng. 650, 147–153 (1986).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited