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Applied Optics

Applied Optics


  • Vol. 29, Iss. 28 — Oct. 1, 1990
  • pp: 4310–4313

Low-optical-loss glass thin films

Mool C. Gupta  »View Author Affiliations

Applied Optics, Vol. 29, Issue 28, pp. 4310-4313 (1990)

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Low-optical-loss glass thin films have been prepared using sputtering and electron beam deposition methods. Results of film composition and optical property measurements are presented. Glass films have been prepared with optical loss values of 0.5 dB/cm. We discuss factors limiting the reduction in optical loss for sputtered and vapor-deposited films. These films can be easily patterned using standard photolithographic processes for fabrication of integrated optics components, such as grating couplers and planar lenses.

© 1990 Optical Society of America

Original Manuscript: September 18, 1989
Published: October 1, 1990

Mool C. Gupta, "Low-optical-loss glass thin films," Appl. Opt. 29, 4310-4313 (1990)

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  1. R. V. VanDewqestine, A. J. Morrow, “Developments in Optical Waveguide Fabrication by the Outside Vapor Deposition Process,” IEEE/OSA J. Lightwave Technol. LT-4, 1020–1025 (1986). [CrossRef]
  2. C. H. Henry, R. F. Kazarinov, H. J. Lee, K. J. Orlowsky, L. E. Katz, “Low Loss Si3N4–SiO2 Optical Waveguides on Si,” Appl. Opt. 26, 2621–2624 (1987). [CrossRef] [PubMed]
  3. S. Dutta, H. E. Jackson, J. T. Boyd, “Reduction of Scattering from a Glass Thin Film Optical Waveguide by CO2 Laser Annealing,” Appl. Phys. Lett. 37, 512–514 (1980). [CrossRef]
  4. R. Th. Kersten, H. F. Mahlein, W. Rauscher, “Optical Losses of Evaporation Deposited Dielectric Waveguides,” Thin Solid Films 28, 369–374 (1975). [CrossRef]
  5. J. E. Goell, R. D. Standley, “Sputtered Glass Waveguide for Integrated Optical Circuits,” Bell Syst. Tech. J. 48, 3445–3448 (1969).
  6. C. W. Pitt, F. R. Gfeller, R. J. Stevens, “R. F. Sputtered Thin Films for Integrated Optical Components,” Thin Solid Films 26, 25–51 (1975). [CrossRef]
  7. Y. Shimoto, H. Matsumaru, T. Nishimure, “Optical Characteristics of Corning 7059 Glass Films Deposited by RF Sputtering,” Jpn. J. Appl. Phys. Suppl. 2, Pt. 1, 701–704 (1974).
  8. H. Jerominek, S. Patela, J. Y. D. Pomerleau, C. Delisle, R. Tremblay, “Some Properties of R. F. Planar Magnetron-Sputtered Corning 7059 Glass Films,” Thin Solid Films 146, 191–200 (1987). [CrossRef]
  9. J. E. Goell, “Barium Silicate Films for Integrated Optical Circuits,” Appl. Opt. 12, 737–742 (1973). [CrossRef] [PubMed]
  10. W. Stutius, W. Streifer, “Silicon Nitride Films on Silicon for Optical Waveguides,” Appl. Opt. 16, 3218–3222 (1977). [CrossRef] [PubMed]
  11. W. C. Borland, D. E. Zelmon, C. J. Radens, J. T. Boyd, H. E. Jackson, “Properties of Four-Layer Planar Optical Waveguides Near Cutoff,” IEEE J. Quantum Electron. QE-23, 1172–1179 (1987). [CrossRef]
  12. P. K. Tien, “Light Waves in Thin Films and Integrated Optics,” Appl. Opt. 10, 2395–2413 (1971). [CrossRef] [PubMed]
  13. E. M. Levin, C. R. Robbins, M. F. McMurdie, “Phase Diagram for Ceramists,” compiled at Nat. Bur. Stand. (U.S.) and published by Amer. Ceramic Soc. (1964) Figs. 558–560.

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