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Applied Optics

Applied Optics


  • Vol. 29, Iss. 34 — Dec. 1, 1990
  • pp: 5038–5039

Optical linewidth measurements using a polarizing microscope with crossed polarizers

Richard Barakat  »View Author Affiliations

Applied Optics, Vol. 29, Issue 34, pp. 5038-5039 (1990)

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Attention is called to an optical linewidth measurement procedure based on diffraction imagery by a polarizing microscope with crossed polarizers.

© 1990 Optical Society of America

Original Manuscript: December 19, 1989
Published: December 1, 1990

Richard Barakat, "Optical linewidth measurements using a polarizing microscope with crossed polarizers," Appl. Opt. 29, 5038-5039 (1990)

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  1. W. M. Bullis, D. Nyyssonen, “Optical Linewidth Measurements on Photomasks and Wafers,” in VLSI Electronics: Microstructure Science, Vol. 3, N. G. Einspruch, Ed. (Academic, New York, 1982), Chap. 7.
  2. D. Nyyssonen, R. Larrabee, “Submicrometer Linewidth Metrology in the Optical Microscope,” J. Res. Natl. Bur. Stand. 92, 187–204 (1987). [CrossRef]
  3. B. J. Lin, “Optical Methods for Fine Line Lithography,” in Fine Line Lithography, R. Neuman, Ed. (North-Holland, New York, 1980), Chap. 2.
  4. R. Barakat, “Incoherent Diffraction Imagery by a Polarizing Microscope with Crossed Polarizers,” Opt. Acta 27, 847–862 (1980). [CrossRef]
  5. Kubota, Saito, “Diffraction Images in the Polarizing Microscope,” Opt J. Soc. Am., 49, 191–198 (1959). [CrossRef]

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