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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 34 — Dec. 1, 1990
  • pp: 5069–5073

Simultaneous measurement of refractive index and thickness of thin film by polarized reflectances

Tami Kihara and Kiyoshi Yokomori  »View Author Affiliations


Applied Optics, Vol. 29, Issue 34, pp. 5069-5073 (1990)
http://dx.doi.org/10.1364/AO.29.005069


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Abstract

A new technique to obtain the refractive index and thickness of a thin film simultaneously is presented. The of p-polarized light and s-polarized light are measured at various angles of incidence, and by a reflectances numerical procedure the film index and thickness are extracted from the measured reflectances. The and numerical procedure are simple, and the values obtained are accurate. As an example, we measurements made measurements on a single layer film (SiO2/Si) and a double layer film (SiON/SiO2/Si) and confirmed that the values obtained were consistent.

© 1990 Optical Society of America

History
Original Manuscript: November 11, 1989
Published: December 1, 1990

Citation
Tami Kihara and Kiyoshi Yokomori, "Simultaneous measurement of refractive index and thickness of thin film by polarized reflectances," Appl. Opt. 29, 5069-5073 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-34-5069


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References

  1. F. Reizmann, W. Van Gelder, “Optical Thickness Measurement of SiO2–Si3N4 Films on Silicon,” Solid-State Electron. 10, 625–632 (1967). [CrossRef]
  2. W. A. Pliskin, Progress in Analytic Chemistry, Vol. 2, E. M. Murt, W. G. Guedner, Ed. (Plenum, New York, 1969), pp. 1–34.
  3. W. A. Pliskin, E. E. Conrad, “Nondestructive Determination of Thickness and Refractive Index of Transparent Films,” IBM J. Res. Dev. 8, 43–51 (1964). [CrossRef]
  4. R. M. A. Azzam, A. R. M. Zaghloul, “Polarization-Independent Reflectance Matching (PIRM) a Technique for the Determining of the Refractive Index and Thickness of Transparent Films,” J. Opt. Paris 8, 201–205 (1977). [CrossRef]
  5. R. J. Archer, “Determination of Properties of Films on Silicon by the Method of Ellipsometry,” J. Opt. Soc. Am. 52, 970–977 (1962). [CrossRef]
  6. R. M. A. Azzam, N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1977).
  7. J. Shewchun, E. C. Rowe, “Ellipsometric Technique for Obtaining Substrate Optical Constants,” J. Appl. Phys. 41, 4128–4138 (1970). [CrossRef]
  8. M. M. Ibrahim, N. M. Bashara, “Parameter-Correlation and Computational Consideration in Multiple-Angle Ellipsometry,” J. Opt. Soc. Am. 61, 1622 (1971). [CrossRef]
  9. J. R. Zeidler, R. B. Kohles, N. M. Bashara, “Sensitivity of the Ellipsometric Parameters to Angle-of-Incidence Variations,” Appl. Opt. 13, 1591–1594 (1974). [CrossRef] [PubMed]
  10. M. Born, E. Wolf, Principles of Optics (Pergamon, Oxford, 1980), Sec. 13.4. We replaced the equations in this reference by using Muller’s Nebraska conventions and definitions.11
  11. R. H. Muller, “Definitions and Conventions in Ellipsometry,” Surf. Sci. 16, 14–33 (1969). [CrossRef]

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