A new technique to obtain the refractive index and thickness of a thin film simultaneously is presented. The reflectances of p-polarized light and s-polarized light are measured at various angles of incidence, and by a numerical procedure the film index and thickness are extracted from the measured reflectances. The measurements and numerical procedure are simple, and the values obtained are accurate. As an example, we made measurements on a single layer film (SiO2/Si) and a double layer film (SiON/SiO2/Si) and confirmed that the values obtained were consistent.
© 1990 Optical Society of America
Tami Kihara and Kiyoshi Yokomori, "Simultaneous measurement of refractive index and thickness of thin film by polarized reflectances," Appl. Opt. 29, 5069-5073 (1990)